Organization profile

Profile Information

The focus of research in the Huddersfield Ion Beam Centre is the use of energetic particles for a variety of purposes including RF generation, medical applications, studies of semiconductor materials, simulation of radiation damage in nuclear materials and the generation of nuclear power (accelerator driven subcritical reactors). Although the particles of primary interest are energetic ions of various types, research in the Centre also involves the use of electrons and neutrons. Activities within the Centre also include the development of new and innovative artificial electromagnetic media and accelerator technologies.

The Ion Beam Centre is home to two unique UK facilities, MIAMI (Microscopes and Ion Accelerators for Materials Investigations) and MEIS (Medium Energy Ion Scattering). The Centre is part of the UK National Ion Beam Centre and is made up of two groups, the Accelerator group and the Electron Microscopy and Materials Analysis (EMMA) group.

Fingerprint Dive into the research topics where Ion Beam Centre is active. These topic labels come from the works of this organisation's members. Together they form a unique fingerprint.

Ion bombardment Engineering & Materials Science

ion irradiation Physics & Astronomy

Ions Engineering & Materials Science

accelerators Physics & Astronomy

Irradiation Engineering & Materials Science

Transmission electron microscopy Engineering & Materials Science

Helium Chemical Compounds

Graphite Chemical Compounds

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Profiles

Emily Aradi

E.Aradi@hud.ac.uk

Department of Engineering and Technology - Research Fellow
School of Computing and Engineering
Ion Beam Centre

Person: Academic

Steve Donnelly

s.e.donnelly@hud.ac.uk

School of Computing and Engineering - Dean - School of Computing & Engineering
Department of Engineering and Technology
Ion Beam Centre - Director

Person: Academic

Robert Edgecock

t.r.edgecock@hud.ac.uk

Department of Engineering and Technology - Professor
School of Computing and Engineering
Ion Beam Centre - Member

Person: Academic

Research Output 2012 2019

79 Article
21 Conference contribution
4 Conference article
3 Editorial
4 More

Analysis of plasma enhanced pulsed laser deposition of transition metal oxide thin films using medium energy ion scattering

Rossall, A., Van Den Berg, J., Meehan, D., Rajendiran, S. & Wagenaars, E., 1 Jul 2019, In : Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 450, p. 274-278 5 p.

Research output: Contribution to journal › Article

Open Access

File

ion scattering

Pulsed laser deposition

Oxide films

pulsed laser deposition

Transition metals

2 Citations (Scopus)

Arsenic Plasma Doping in Si Characterized by High Resolution Medium Energy Ion Scattering Depth Profile Analysis

Van Den Berg, J. A., Rossall, A. K. & England, J., 22 Aug 2019, 2018 22nd International Conference on Ion Implantation Technology, IIT 2018 - Proceedings. Haublein, V. & Ryssel, H. (eds.). Institute of Electrical and Electronics Engineers Inc., Vol. 2018-September. p. 263-266 4 p. 8807964

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Arsenic

ion scattering

arsenic

Doping (additives)

Scattering

1 Citation (Scopus)