Research Output per year
Organization profile
Profile Information
The focus of research in the Huddersfield Ion Beam Centre is the use of energetic particles for a variety of purposes including RF generation, medical applications, studies of semiconductor materials, simulation of radiation damage in nuclear materials and the generation of nuclear power (accelerator driven subcritical reactors). Although the particles of primary interest are energetic ions of various types, research in the Centre also involves the use of electrons and neutrons. Activities within the Centre also include the development of new and innovative artificial electromagnetic media and accelerator technologies.
The Ion Beam Centre is home to two unique UK facilities, MIAMI (Microscopes and Ion Accelerators for Materials Investigations) and MEIS (Medium Energy Ion Scattering). The Centre is part of the UK National Ion Beam Centre and is made up of two groups, the Accelerator group and the Electron Microscopy and Materials Analysis (EMMA) group.
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Network
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Profiles

Emily Aradi
- Department of Engineering and Technology - Research Fellow
- School of Computing and Engineering
- Ion Beam Centre
Person: Academic

Steve Donnelly
- School of Computing and Engineering - Dean - School of Computing & Engineering
- Department of Engineering and Technology
- Ion Beam Centre - Director
Person: Academic

Robert Edgecock
- Department of Engineering and Technology - Professor
- School of Computing and Engineering
- Ion Beam Centre - Member
Person: Academic
Research Output 2012 2019
Analysis of plasma enhanced pulsed laser deposition of transition metal oxide thin films using medium energy ion scattering
Rossall, A., Van Den Berg, J., Meehan, D., Rajendiran, S. & Wagenaars, E., 1 Jul 2019, In : Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 450, p. 274-278 5 p.Research output: Contribution to journal › Article
Arsenic Plasma Doping in Si Characterized by High Resolution Medium Energy Ion Scattering Depth Profile Analysis
Van Den Berg, J. A., Rossall, A. K. & England, J., 22 Aug 2019, 2018 22nd International Conference on Ion Implantation Technology, IIT 2018 - Proceedings. Haublein, V. & Ryssel, H. (eds.). Institute of Electrical and Electronics Engineers Inc., Vol. 2018-September. p. 263-266 4 p. 8807964Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
Characterization of arsenic plasma doping and postimplant processing of silicon using medium energy ion scattering
van den Berg, J., Rossall, A. & England, J., 1 May 2019, In : Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 37, 3, 9 p., 032901.Research output: Contribution to journal › Article
Projects 2012 2022
ARIES: Accelerator Research and Innovation for European Science and Society
1/05/17 → 30/04/21
Project: Research
Press / Media
Testing radiation resistance without using a nuclear reactor
Matheus Araujo Tunes, Stephen Donnelly & Jonathan Hinks
3/04/19 → 5/04/19
3 items of Media coverage
Press/Media: Other