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Last updated 15th March 2023

Dr Rossall has been a lecturer in Electrical and Electronic Engineering since May 2022. This academic appointment followed on from a previous appointment as a Research Fellow in the Medium Energy Ion Scattering (MEIS) Facility which is part of the University of Huddersfield’s Ion Beam Centre and part of the EPSRC funded UK National Ion Beam Centre (uknibc.co.uk).

Prior to joining Huddersfield, PhD research was undertaken at the University of York and examined the use of laser produced plasma sources as probes for plasma opacity, a source for fast particle production and the 2D imaging of hydrodynamic instabilities.  Experimental work involved multi-institutional experiments using large scale laser facilities, such as the Central Laser Facility (CLF) near Didcot, UK and facilities overseas in Prague and Mumbai.  He gained postdoctoral experience at the Institute of Cancer Research (ICR) researching detector technology for multi-spectral (colour) x-ray imaging (from Sep 2011 to Dec 2012) and at the University of York developing a computational framework to simulate EUV and X-ray beam interaction with solid material (from Jan 2013 to Oct 2015).

Since joining the University of Huddersfield, Dr Rossall has worked on a range of collaborative projects, both academic and industrial, in research areas such as the ion irradiation of nanoparticles, plasma assisted doping for microelectronic devices and plasma enhanced pulsed laser deposition of thin films for electronics. These projects were part of the EPSRC funded UK National Ion Beam Centre (£2.5M) on which Dr Rossall is a co-investigator.

In addition to commercial and UK National Ion Beam Centre projects, Dr Rossall has worked on three consecutive Innovate UK funded industrial collaborative research projects examining charge neutralisation for electron beam additive manufacture (EBAM).

His main area of research examines the manufacture of thin films using extreme ultraviolet (EUV) lasers for physical vapour deposition and the application of these thin films for electronics applications. Some of the applications include transparent conducting oxides for optoelectronics, heterogeneous electronics, triboelectric nanogenerators and flexible electronics. Analysis of these thin films, including electronic characterisation, nanometre scale depth profiling, interferometry and mechanical testing and is largely done on campus at Huddersfield using the capabilities of the Ion Beam Centre.