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Jaap Van Den Berg

Prof

 https://orcid.org/0000-0003-2527-2523
  • 1714 Citations
  • 24 h-Index
1977 …2019

Research output per year

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Personal profile

Google Scholar h-Index

24 Last checked 30 June 2020

Biography

Jakob (Jaap) joined the University of Huddersfield in October 2011 as a Research Professor, with his primary objective the re-establishment of the Medium Energy Ion Scattering (MEIS) Facility, formerly based at STFC Daresbury Laboratory within the International Institute for Accelerator Applications at Huddersfield. Officially reopened in 2015 after extensive upgrading, the MEIS laboratory under his charge, is now part of the UK National Ion Beam Centre, funded by EPSRC to provide analytical support to the UK research community.

After obtaining his Ir. degree in Applied Physics from the University of Groningen in the Netherlands, he moved to the UK to undertake postgraduate research in the Department of Department of Electronic and Electrical Engineering at the University of Salford, obtaining his PhD in 1979. Following an Adjunct Lectureship in Physics at the University of Arhus (DK) and a 6-year Senior Scientific Officer post in the Department of Chemistry at UMIST, he returned to the University of Salford as Lecturer in Electronic and Electrical Engineering, was later promoted Senior Lecturer and after moving to Physics, to Reader in Physics in 2000. In 2003 he became Professor of Ion Beam Physics at Salford where, from 2003 to 2007, he was also Head of Physics.

Research Expertise and Interests

  • Ranges, disorder formation & annealing of ultra-low energy implants into Si using medium energy ion scattering (MEIS).
  • The characterisation and metrology of dielectric nanometre films for microelectronic and optical applications using MEIS and related high depth resolution analytical techniques.
  • The evolution of the Cs build up in SIMS studied by MEIS
  • The characterisation of high current ion beam plasma using mass & energy analysis and Langmuir probe.
  • The application of in situ ion beam irradiation in the TEM.
  • Charge build-up and compensation studies in E beam ALM & equipment development

Research Expertise and Interests

  • Ion Beams
  • Materials Analysis
  • Modification
  • Low Energy Ion Scattering
  • Surface Analysis
  • Medium Energy Ion Scattering
  • Materials Characterisation
  • Ultra-Low Energy Ion Implantation
  • Shallow Doping

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Research Output

  • 1714 Citations
  • 24 h-Index
  • 96 Article
  • 17 Conference contribution
  • 11 Conference article
  • 1 Editorial

Analysis of plasma enhanced pulsed laser deposition of transition metal oxide thin films using medium energy ion scattering

Rossall, A., Van Den Berg, J., Meehan, D., Rajendiran, S. & Wagenaars, E., 1 Jul 2019, In : Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 450, p. 274-278 5 p.

Research output: Contribution to journal › Article

Open Access
File

    • Arsenic Plasma Doping in Si Characterized by High Resolution Medium Energy Ion Scattering Depth Profile Analysis

    Van Den Berg, J. A., Rossall, A. K. & England, J., 22 Aug 2019, 2018 22nd International Conference on Ion Implantation Technology, IIT 2018 - Proceedings. Haublein, V. & Ryssel, H. (eds.). Institute of Electrical and Electronics Engineers Inc., Vol. 2018-September. p. 263-266 4 p. 8807964

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

    • 2 Citations (Scopus)

    Characterization of arsenic plasma doping and postimplant processing of silicon using medium energy ion scattering

    van den Berg, J., Rossall, A. & England, J., 1 May 2019, In : Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 37, 3, 9 p., 032901.

    Research output: Contribution to journal › Article

    Open Access
    File
    • 1 Citation (Scopus)

    Use of TRIDYN and medium energy ion scattering to calibrate an industrial arsenic plasma doping process

    England, J., Van den Berg, J. & Rossall, A., 1 May 2019, In : Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 37, 3, 9 p., 031206.

    Research output: Contribution to journal › Article

    Open Access
    File
    • 1 Citation (Scopus)

    Atomic Layer Deposition of Ruthenium Thin Films from (Ethylbenzyl) (1-Ethyl-1,4-cyclohexadienyl) Ru: Process Characteristics, Surface Chemistry, and Film Properties

    Popovici, M., Groven, B., Marcoen, K., Phung, Q. M., Dutta, S., Swerts, J., Meersschaut, J., van den Berg, J. A., Franquet, A., Moussa, A., Vanstreels, K., Lagrain, P., Bender, H., Jurczak, M., Van Elshocht, S., Delabie, A. & Adelmann, C., 13 Jun 2017, In : Chemistry of Materials. 29, 11, p. 4654-4666 13 p.

    Research output: Contribution to journal › Article

    • 20 Citations (Scopus)

    Press / Media

    University of Huddersfield Recognised as Leading Ion Beam Centre

    Stephen Donnelly, Jonathan Hinks & Jakob Van Den Berg

    26/05/17

    1 item of Media coverage

    Press/Media: Expert Comment

    UK National Ion Beam Centre Benefits from New £3.5 Million Microscope

    Jakob Van Den Berg & Stephen Donnelly

    23/05/17

    1 Media contribution

    Press/Media: Expert Comment