A fixed-grid approach for diffusion- and reaction-controlled wet chemical etching

P. Rath; J. C. Chai; H. Zheng; Y. C. Lam; V. M. Murukeshan; H. Zhu

doi:10.1016/j.ijheatmasstransfer.2004.12.033

A fixed-grid approach for diffusion- and reaction-controlled wet chemical etching

P. Rath, J. C. Chai, H. Zheng, Y. C. Lam, V. M. Murukeshan, H. Zhu

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

A new mathematical model for wet chemical etching process is presented. The proposed method is a fixed-grid approach based on the total concentration of etchant. It is analogous to the enthalpy method used in the modeling of melting/solidification problems. The total concentration is the sum of the unreacted etchant concentration and the reacted etchant concentration. The reacted etchant concentration is used to capture the etchfront. The governing equation based on the total concentration is formulated. This governing equation is shown to be equivalent to the conventional governing equation. It also contains the interface condition. A procedure to update the reacted concentration is presented. Numerical results for one-dimensional diffusion-controlled and reaction-controlled etching are presented.

Original language	English
Pages (from-to)	2140-2149
Number of pages	10
Journal	International Journal of Heat and Mass Transfer
Volume	48
Issue number	11
Early online date	17 Mar 2005
DOIs	https://doi.org/10.1016/j.ijheatmasstransfer.2004.12.033
Publication status	Published - May 2005
Externally published	Yes

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10.1016/j.ijheatmasstransfer.2004.12.033

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title = "A fixed-grid approach for diffusion- and reaction-controlled wet chemical etching",

abstract = "A new mathematical model for wet chemical etching process is presented. The proposed method is a fixed-grid approach based on the total concentration of etchant. It is analogous to the enthalpy method used in the modeling of melting/solidification problems. The total concentration is the sum of the unreacted etchant concentration and the reacted etchant concentration. The reacted etchant concentration is used to capture the etchfront. The governing equation based on the total concentration is formulated. This governing equation is shown to be equivalent to the conventional governing equation. It also contains the interface condition. A procedure to update the reacted concentration is presented. Numerical results for one-dimensional diffusion-controlled and reaction-controlled etching are presented.",

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AU - Rath, P.

AU - Chai, J. C.

AU - Zheng, H.

AU - Lam, Y. C.

AU - Murukeshan, V. M.

AU - Zhu, H.

PY - 2005/5

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AB - A new mathematical model for wet chemical etching process is presented. The proposed method is a fixed-grid approach based on the total concentration of etchant. It is analogous to the enthalpy method used in the modeling of melting/solidification problems. The total concentration is the sum of the unreacted etchant concentration and the reacted etchant concentration. The reacted etchant concentration is used to capture the etchfront. The governing equation based on the total concentration is formulated. This governing equation is shown to be equivalent to the conventional governing equation. It also contains the interface condition. A procedure to update the reacted concentration is presented. Numerical results for one-dimensional diffusion-controlled and reaction-controlled etching are presented.

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VL - 48

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JO - International Journal of Heat and Mass Transfer

JF - International Journal of Heat and Mass Transfer

SN - 0017-9310

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ER -

A fixed-grid approach for diffusion- and reaction-controlled wet chemical etching

Abstract

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