A fixed-grid approach for diffusion- and reaction-controlled wet chemical etching

P. Rath, J. C. Chai, H. Zheng, Y. C. Lam, V. M. Murukeshan, H. Zhu

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

A new mathematical model for wet chemical etching process is presented. The proposed method is a fixed-grid approach based on the total concentration of etchant. It is analogous to the enthalpy method used in the modeling of melting/solidification problems. The total concentration is the sum of the unreacted etchant concentration and the reacted etchant concentration. The reacted etchant concentration is used to capture the etchfront. The governing equation based on the total concentration is formulated. This governing equation is shown to be equivalent to the conventional governing equation. It also contains the interface condition. A procedure to update the reacted concentration is presented. Numerical results for one-dimensional diffusion-controlled and reaction-controlled etching are presented.

LanguageEnglish
Pages2140-2149
Number of pages10
JournalInternational Journal of Heat and Mass Transfer
Volume48
Issue number11
Early online date17 Mar 2005
DOIs
Publication statusPublished - May 2005
Externally publishedYes

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Wet etching
Solidification
Enthalpy
Etching
Melting
grids
etching
Mathematical models
etchants
solidification
mathematical models
enthalpy
melting

Cite this

Rath, P. ; Chai, J. C. ; Zheng, H. ; Lam, Y. C. ; Murukeshan, V. M. ; Zhu, H. / A fixed-grid approach for diffusion- and reaction-controlled wet chemical etching. In: International Journal of Heat and Mass Transfer. 2005 ; Vol. 48, No. 11. pp. 2140-2149.
@article{71816b5451bc4524b612592c2a8f48cf,
title = "A fixed-grid approach for diffusion- and reaction-controlled wet chemical etching",
abstract = "A new mathematical model for wet chemical etching process is presented. The proposed method is a fixed-grid approach based on the total concentration of etchant. It is analogous to the enthalpy method used in the modeling of melting/solidification problems. The total concentration is the sum of the unreacted etchant concentration and the reacted etchant concentration. The reacted etchant concentration is used to capture the etchfront. The governing equation based on the total concentration is formulated. This governing equation is shown to be equivalent to the conventional governing equation. It also contains the interface condition. A procedure to update the reacted concentration is presented. Numerical results for one-dimensional diffusion-controlled and reaction-controlled etching are presented.",
author = "P. Rath and Chai, {J. C.} and H. Zheng and Lam, {Y. C.} and Murukeshan, {V. M.} and H. Zhu",
year = "2005",
month = "5",
doi = "10.1016/j.ijheatmasstransfer.2004.12.033",
language = "English",
volume = "48",
pages = "2140--2149",
journal = "International Journal of Heat and Mass Transfer",
issn = "0017-9310",
publisher = "Elsevier Limited",
number = "11",

}

A fixed-grid approach for diffusion- and reaction-controlled wet chemical etching. / Rath, P.; Chai, J. C.; Zheng, H.; Lam, Y. C.; Murukeshan, V. M.; Zhu, H.

In: International Journal of Heat and Mass Transfer, Vol. 48, No. 11, 05.2005, p. 2140-2149.

Research output: Contribution to journalArticle

TY - JOUR

T1 - A fixed-grid approach for diffusion- and reaction-controlled wet chemical etching

AU - Rath, P.

AU - Chai, J. C.

AU - Zheng, H.

AU - Lam, Y. C.

AU - Murukeshan, V. M.

AU - Zhu, H.

PY - 2005/5

Y1 - 2005/5

N2 - A new mathematical model for wet chemical etching process is presented. The proposed method is a fixed-grid approach based on the total concentration of etchant. It is analogous to the enthalpy method used in the modeling of melting/solidification problems. The total concentration is the sum of the unreacted etchant concentration and the reacted etchant concentration. The reacted etchant concentration is used to capture the etchfront. The governing equation based on the total concentration is formulated. This governing equation is shown to be equivalent to the conventional governing equation. It also contains the interface condition. A procedure to update the reacted concentration is presented. Numerical results for one-dimensional diffusion-controlled and reaction-controlled etching are presented.

AB - A new mathematical model for wet chemical etching process is presented. The proposed method is a fixed-grid approach based on the total concentration of etchant. It is analogous to the enthalpy method used in the modeling of melting/solidification problems. The total concentration is the sum of the unreacted etchant concentration and the reacted etchant concentration. The reacted etchant concentration is used to capture the etchfront. The governing equation based on the total concentration is formulated. This governing equation is shown to be equivalent to the conventional governing equation. It also contains the interface condition. A procedure to update the reacted concentration is presented. Numerical results for one-dimensional diffusion-controlled and reaction-controlled etching are presented.

UR - http://www.scopus.com/inward/record.url?scp=17044382170&partnerID=8YFLogxK

U2 - 10.1016/j.ijheatmasstransfer.2004.12.033

DO - 10.1016/j.ijheatmasstransfer.2004.12.033

M3 - Article

VL - 48

SP - 2140

EP - 2149

JO - International Journal of Heat and Mass Transfer

T2 - International Journal of Heat and Mass Transfer

JF - International Journal of Heat and Mass Transfer

SN - 0017-9310

IS - 11

ER -