A new technique for the measurement of implanted He profiles in nickel

S. E. Donnelly, D. S. Whitmell, R. S. Nelson

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

A new technique of measuring the range of helium ions implanted at low concentrations into nickel is described. The residual amount of helium in a foil is measured by a combination of gas release and selective vibro-polishing. The method, illustrated by the results of some preliminary experiments, is sufficiently sensitive to enable the range, to be measured with peak implanted gas concentrations of the order of 10−7atoms per nickel atom (i.e. a sensitivity limit of 10−8 atom/atom) where bubble formation is unlikely. The mean projected range of 100 keV helium ions in nickel was found to be 2800 Å, together with a second peak at 5250 Å which is thought to be due to channelling. A significant fraction of the helium diffused interstitially to depths greater than 1 μm.
Original languageEnglish
Pages (from-to)145-148
Number of pages4
JournalRadiation Effects
Volume33
Issue number3
DOIs
Publication statusPublished - 1 Aug 1977
Externally publishedYes

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