A new technique for the measurement of implanted He profiles in nickel

S. E. Donnelly; D. S. Whitmell; R. S. Nelson

doi:10.1080/00337577708233098

A new technique for the measurement of implanted He profiles in nickel

S. E. Donnelly, D. S. Whitmell, R. S. Nelson

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Abstract

A new technique of measuring the range of helium ions implanted at low concentrations into nickel is described. The residual amount of helium in a foil is measured by a combination of gas release and selective vibro-polishing. The method, illustrated by the results of some preliminary experiments, is sufficiently sensitive to enable the range, to be measured with peak implanted gas concentrations of the order of 10−7atoms per nickel atom (i.e. a sensitivity limit of 10−8 atom/atom) where bubble formation is unlikely. The mean projected range of 100 keV helium ions in nickel was found to be 2800 Å, together with a second peak at 5250 Å which is thought to be due to channelling. A significant fraction of the helium diffused interstitially to depths greater than 1 μm.

Original language	English
Pages (from-to)	145-148
Number of pages	4
Journal	Radiation Effects
Volume	33
Issue number	3
DOIs	https://doi.org/10.1080/00337577708233098
Publication status	Published - 1 Aug 1977
Externally published	Yes

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title = "A new technique for the measurement of implanted He profiles in nickel",

abstract = "A new technique of measuring the range of helium ions implanted at low concentrations into nickel is described. The residual amount of helium in a foil is measured by a combination of gas release and selective vibro-polishing. The method, illustrated by the results of some preliminary experiments, is sufficiently sensitive to enable the range, to be measured with peak implanted gas concentrations of the order of 10−7atoms per nickel atom (i.e. a sensitivity limit of 10−8 atom/atom) where bubble formation is unlikely. The mean projected range of 100 keV helium ions in nickel was found to be 2800 {\AA}, together with a second peak at 5250 {\AA} which is thought to be due to channelling. A significant fraction of the helium diffused interstitially to depths greater than 1 μm.",

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year = "1977",

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T1 - A new technique for the measurement of implanted He profiles in nickel

AU - Donnelly, S. E.

AU - Whitmell, D. S.

AU - Nelson, R. S.

PY - 1977/8/1

Y1 - 1977/8/1

N2 - A new technique of measuring the range of helium ions implanted at low concentrations into nickel is described. The residual amount of helium in a foil is measured by a combination of gas release and selective vibro-polishing. The method, illustrated by the results of some preliminary experiments, is sufficiently sensitive to enable the range, to be measured with peak implanted gas concentrations of the order of 10−7atoms per nickel atom (i.e. a sensitivity limit of 10−8 atom/atom) where bubble formation is unlikely. The mean projected range of 100 keV helium ions in nickel was found to be 2800 Å, together with a second peak at 5250 Å which is thought to be due to channelling. A significant fraction of the helium diffused interstitially to depths greater than 1 μm.

AB - A new technique of measuring the range of helium ions implanted at low concentrations into nickel is described. The residual amount of helium in a foil is measured by a combination of gas release and selective vibro-polishing. The method, illustrated by the results of some preliminary experiments, is sufficiently sensitive to enable the range, to be measured with peak implanted gas concentrations of the order of 10−7atoms per nickel atom (i.e. a sensitivity limit of 10−8 atom/atom) where bubble formation is unlikely. The mean projected range of 100 keV helium ions in nickel was found to be 2800 Å, together with a second peak at 5250 Å which is thought to be due to channelling. A significant fraction of the helium diffused interstitially to depths greater than 1 μm.

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SN - 1042-0150

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A new technique for the measurement of implanted He profiles in nickel

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