A new technique for the measurement of implanted He profiles in nickel

S. E. Donnelly, D. S. Whitmell, R. S. Nelson

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

A new technique of measuring the range of helium ions implanted at low concentrations into nickel is described. The residual amount of helium in a foil is measured by a combination of gas release and selective vibro-polishing. The method, illustrated by the results of some preliminary experiments, is sufficiently sensitive to enable the range, to be measured with peak implanted gas concentrations of the order of 10−7atoms per nickel atom (i.e. a sensitivity limit of 10−8 atom/atom) where bubble formation is unlikely. The mean projected range of 100 keV helium ions in nickel was found to be 2800 Å, together with a second peak at 5250 Å which is thought to be due to channelling. A significant fraction of the helium diffused interstitially to depths greater than 1 μm.
LanguageEnglish
Pages145-148
Number of pages4
JournalRadiation Effects
Volume33
Issue number3
DOIs
Publication statusPublished - 1 Aug 1977
Externally publishedYes

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Helium
Nickel
helium ions
nickel
profiles
helium
Atoms
atoms
Gases
Ions
polishing
gases
Bubble formation
low concentrations
foils
bubbles
Polishing
Metal foil
sensitivity
Experiments

Cite this

Donnelly, S. E. ; Whitmell, D. S. ; Nelson, R. S. / A new technique for the measurement of implanted He profiles in nickel. In: Radiation Effects. 1977 ; Vol. 33, No. 3. pp. 145-148.
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A new technique for the measurement of implanted He profiles in nickel. / Donnelly, S. E.; Whitmell, D. S.; Nelson, R. S.

In: Radiation Effects, Vol. 33, No. 3, 01.08.1977, p. 145-148.

Research output: Contribution to journalArticle

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