A Total Concentration Fixed-Grid Method for Two-Dimensional Wet Chemical Etching

P. Rath, J. C. Chai, Y. C. Lam, V. M. Murukeshan, H. Zheng

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

A total concentration fixed-grid method is presented in this paper to model the two-dimensional wet chemical etching. Two limiting cases are discussed, namely - the diffusion-controlled etching and the reaction-controlled etching. A total concentration, which is the sum of the unreacted and the reacted etchant concentrations, is defined. Using this newly defined total concentration, the governing equation also contains the interface condition. A new update procedure for the reacted concentration is formulated. For demonstration, the finite-volume method is used to solve the governing equation with prescribed initial and boundary conditions. The effects of reaction rate at the etchant-substrate interface are examined. The results obtained using the total concentration method, are compared with available results from the literature.

Original languageEnglish
Pages (from-to)509-516
Number of pages8
JournalJournal of Heat Transfer
Volume129
Issue number4
DOIs
Publication statusPublished - Apr 2007
Externally publishedYes

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Wet etching
Etching
grids
etching
Finite volume method
Reaction rates
Demonstrations
etchants
Boundary conditions
Substrates
finite volume method
reaction kinetics
boundary conditions

Cite this

Rath, P. ; Chai, J. C. ; Lam, Y. C. ; Murukeshan, V. M. ; Zheng, H. / A Total Concentration Fixed-Grid Method for Two-Dimensional Wet Chemical Etching. In: Journal of Heat Transfer. 2007 ; Vol. 129, No. 4. pp. 509-516.
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A Total Concentration Fixed-Grid Method for Two-Dimensional Wet Chemical Etching. / Rath, P.; Chai, J. C.; Lam, Y. C.; Murukeshan, V. M.; Zheng, H.

In: Journal of Heat Transfer, Vol. 129, No. 4, 04.2007, p. 509-516.

Research output: Contribution to journalArticle

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