Advances in optical metrology and instrumentation: introduction

Jonathan D. Ellis, Han Haitjema, Xiangqian Jiang, Ki-Nam Joo, Richard Leach

Research output: Contribution to journalEditorialpeer-review

4 Citations (Scopus)


Optical measurement and characterization are two of the pillars of metrology. The ability to measure precisely with high dynamic range and accuracy betters our understanding of nature and the universe. In this feature issue, we present a collection of articles that delves into the fundamental techniques used to advance the field.
Original languageEnglish
Article number405559
Pages (from-to)OMI1-OMI2
Number of pages2
JournalJournal of the Optical Society of America A: Optics and Image Science, and Vision
Issue number9
Early online date14 Aug 2020
Publication statusPublished - 1 Sep 2020


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