Advances in optical metrology and instrumentation: introduction

Jonathan D. Ellis; Han Haitjema; Xiangqian Jiang; Ki-Nam Joo; Richard Leach

doi:10.1364/JOSAA.405559

Advances in optical metrology and instrumentation: introduction

Jonathan D. Ellis, Han Haitjema, Xiangqian Jiang, Ki-Nam Joo, Richard Leach

Research output: Contribution to journal › Editorial › peer-review

4 Citations (Scopus)

Abstract

Optical measurement and characterization are two of the pillars of metrology. The ability to measure precisely with high dynamic range and accuracy betters our understanding of nature and the universe. In this feature issue, we present a collection of articles that delves into the fundamental techniques used to advance the field.

Original language	English
Article number	405559
Pages (from-to)	OMI1-OMI2
Number of pages	2
Journal	Journal of the Optical Society of America A: Optics and Image Science, and Vision
Volume	37
Issue number	9
Early online date	14 Aug 2020
DOIs	https://doi.org/10.1364/JOSAA.405559
Publication status	Published - 1 Sep 2020

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AU - Ellis, Jonathan D.

AU - Haitjema, Han

AU - Jiang, Xiangqian

AU - Joo, Ki-Nam

AU - Leach, Richard

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AB - Optical measurement and characterization are two of the pillars of metrology. The ability to measure precisely with high dynamic range and accuracy betters our understanding of nature and the universe. In this feature issue, we present a collection of articles that delves into the fundamental techniques used to advance the field.

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M3 - Editorial

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Advances in optical metrology and instrumentation: introduction

Abstract

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