Analysis of plasma enhanced pulsed laser deposition of transition metal oxide thin films using medium energy ion scattering

Andrew Rossall, Jakob Van Den Berg, David Meehan, Sudha Rajendiran, Erik Wagenaars

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

In this study, plasma-enhanced pulsed laser deposition (PE-PLD), which is a novel variant of pulsed laser deposition that combines laser ablation of metal targets with an electrically-produced oxygen plasma background, has been used for the fabrication of ZnO and Cu2O thin films. Samples prepared using the PE-PLD process, with the aim of generating desirable properties for a range of electrical and optical applications, have been analysed using medium energy ion scattering. Using a 100 keV He+ ion beam, high resolution depth profiling of the films was performed with an analysis of the stoichiometry and interface abruptness of these novel materials. It was found that the PE-PLD process can create stoichiometric thin films, the uniformity of which can be controlled by varying the power of the inductively coupled plasma. This technique showed a high deposition rate of ∼0.1 nm s−1.
Original languageEnglish
Pages (from-to)274-278
Number of pages5
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume450
Early online date7 Jul 2018
DOIs
Publication statusPublished - 1 Jul 2019

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