Analysis of tool-mass-acceleration effects onto sub-aperture computer controlled polishing (CCP)

Oliver Faehnle; Guoyu Yu; David Walker

doi:10.1117/12.2236024

Analysis of tool-mass-acceleration effects onto sub-aperture computer controlled polishing (CCP)

Oliver Faehnle, Guoyu Yu, David Walker

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Citation (Scopus)

Abstract

Although computer controlled polishing (CCP) of aspheres and freeforms is one of the best understood state-of-the-art fab processes today, there are yet some unsolved issues: e.g. compared to bonnet polishing, fluid jet polishing is taking less iteration steps reaching the same form accuracy and ion beam figuring eventually is reaching much higher shape accuracies. This paper is a first move into solving this matter by introducing a novel footprint recording approach for CCP. To that aim, a new method for measuring the impact of a single tool mass acceleration value onto footprint shape is presented, the second derivative footprint recording (SECondo) method. First experimental evidence of the SECondo effect is presented, demonstrating that for bonnet polishing, acceleration of tool mass significantly alters the pressure distribution within the footprint and consequently affects its cross section.

Original language	English
Title of host publication	Third European Seminar on Precision Optics Manufacturing
Editors	Rolf Rascher, Oliver Fähnle, Christine Wünsche, Christian Schopf
Publisher	SPIE
Number of pages	5
Volume	10009
ISBN (Electronic)	9781510604230
ISBN (Print)	9781510604223
DOIs	https://doi.org/10.1117/12.2236024
Publication status	Published - 30 Jun 2016
Externally published	Yes
Event	Third European Seminar on Precision Optics Manufacturing - Teisnach, Germany Duration: 12 Apr 2016 → 13 Apr 2016 Conference number: 3

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Publisher	SPIE
Volume	10009
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Third European Seminar on Precision Optics Manufacturing
Country/Territory	Germany
City	Teisnach
Period	12/04/16 → 13/04/16

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10.1117/12.2236024Licence: Unspecified

Cite this

Faehnle, O., Yu, G., & Walker, D. (2016). Analysis of tool-mass-acceleration effects onto sub-aperture computer controlled polishing (CCP). In R. Rascher, O. Fähnle, C. Wünsche, & C. Schopf (Eds.), Third European Seminar on Precision Optics Manufacturing (Vol. 10009). [1000903] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10009). SPIE. https://doi.org/10.1117/12.2236024

Faehnle, Oliver ; Yu, Guoyu ; Walker, David. / Analysis of tool-mass-acceleration effects onto sub-aperture computer controlled polishing (CCP). Third European Seminar on Precision Optics Manufacturing. editor / Rolf Rascher ; Oliver Fähnle ; Christine Wünsche ; Christian Schopf. Vol. 10009 SPIE, 2016. (Proceedings of SPIE - The International Society for Optical Engineering).

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title = "Analysis of tool-mass-acceleration effects onto sub-aperture computer controlled polishing (CCP)",

abstract = "Although computer controlled polishing (CCP) of aspheres and freeforms is one of the best understood state-of-the-art fab processes today, there are yet some unsolved issues: e.g. compared to bonnet polishing, fluid jet polishing is taking less iteration steps reaching the same form accuracy and ion beam figuring eventually is reaching much higher shape accuracies. This paper is a first move into solving this matter by introducing a novel footprint recording approach for CCP. To that aim, a new method for measuring the impact of a single tool mass acceleration value onto footprint shape is presented, the second derivative footprint recording (SECondo) method. First experimental evidence of the SECondo effect is presented, demonstrating that for bonnet polishing, acceleration of tool mass significantly alters the pressure distribution within the footprint and consequently affects its cross section.",

keywords = "Aspheres generation, Bonnet polishing, CCOS, Computer controlled polishing CCP",

author = "Oliver Faehnle and Guoyu Yu and David Walker",

year = "2016",

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series = "Proceedings of SPIE - The International Society for Optical Engineering",

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Faehnle, O, Yu, G & Walker, D 2016, Analysis of tool-mass-acceleration effects onto sub-aperture computer controlled polishing (CCP). in R Rascher, O Fähnle, C Wünsche & C Schopf (eds), Third European Seminar on Precision Optics Manufacturing. vol. 10009, 1000903, Proceedings of SPIE - The International Society for Optical Engineering, vol. 10009, SPIE, Third European Seminar on Precision Optics Manufacturing, Teisnach, Bavaria, Germany, 12/04/16. https://doi.org/10.1117/12.2236024

Analysis of tool-mass-acceleration effects onto sub-aperture computer controlled polishing (CCP). / Faehnle, Oliver; Yu, Guoyu; Walker, David.

Third European Seminar on Precision Optics Manufacturing. ed. / Rolf Rascher; Oliver Fähnle; Christine Wünsche; Christian Schopf. Vol. 10009 SPIE, 2016. 1000903 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10009).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AU - Faehnle, Oliver

AU - Yu, Guoyu

AU - Walker, David

N1 - Conference code: 3

PY - 2016/6/30

Y1 - 2016/6/30

N2 - Although computer controlled polishing (CCP) of aspheres and freeforms is one of the best understood state-of-the-art fab processes today, there are yet some unsolved issues: e.g. compared to bonnet polishing, fluid jet polishing is taking less iteration steps reaching the same form accuracy and ion beam figuring eventually is reaching much higher shape accuracies. This paper is a first move into solving this matter by introducing a novel footprint recording approach for CCP. To that aim, a new method for measuring the impact of a single tool mass acceleration value onto footprint shape is presented, the second derivative footprint recording (SECondo) method. First experimental evidence of the SECondo effect is presented, demonstrating that for bonnet polishing, acceleration of tool mass significantly alters the pressure distribution within the footprint and consequently affects its cross section.

AB - Although computer controlled polishing (CCP) of aspheres and freeforms is one of the best understood state-of-the-art fab processes today, there are yet some unsolved issues: e.g. compared to bonnet polishing, fluid jet polishing is taking less iteration steps reaching the same form accuracy and ion beam figuring eventually is reaching much higher shape accuracies. This paper is a first move into solving this matter by introducing a novel footprint recording approach for CCP. To that aim, a new method for measuring the impact of a single tool mass acceleration value onto footprint shape is presented, the second derivative footprint recording (SECondo) method. First experimental evidence of the SECondo effect is presented, demonstrating that for bonnet polishing, acceleration of tool mass significantly alters the pressure distribution within the footprint and consequently affects its cross section.

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Faehnle O, Yu G, Walker D. Analysis of tool-mass-acceleration effects onto sub-aperture computer controlled polishing (CCP). In Rascher R, Fähnle O, Wünsche C, Schopf C, editors, Third European Seminar on Precision Optics Manufacturing. Vol. 10009. SPIE. 2016. 1000903. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2236024

Analysis of tool-mass-acceleration effects onto sub-aperture computer controlled polishing (CCP)

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