Analysis of tool-mass-acceleration effects onto sub-aperture computer controlled polishing (CCP)

Oliver Faehnle, Guoyu Yu, David Walker

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Although computer controlled polishing (CCP) of aspheres and freeforms is one of the best understood state-of-the-art fab processes today, there are yet some unsolved issues: e.g. compared to bonnet polishing, fluid jet polishing is taking less iteration steps reaching the same form accuracy and ion beam figuring eventually is reaching much higher shape accuracies. This paper is a first move into solving this matter by introducing a novel footprint recording approach for CCP. To that aim, a new method for measuring the impact of a single tool mass acceleration value onto footprint shape is presented, the second derivative footprint recording (SECondo) method. First experimental evidence of the SECondo effect is presented, demonstrating that for bonnet polishing, acceleration of tool mass significantly alters the pressure distribution within the footprint and consequently affects its cross section.

Original languageEnglish
Title of host publicationThird European Seminar on Precision Optics Manufacturing
EditorsRolf Rascher, Oliver Fähnle, Christine Wünsche, Christian Schopf
PublisherSPIE
Number of pages5
Volume10009
ISBN (Electronic)9781510604230
ISBN (Print)9781510604223
DOIs
Publication statusPublished - 30 Jun 2016
Externally publishedYes
EventThird European Seminar on Precision Optics Manufacturing - Teisnach, Germany
Duration: 12 Apr 201613 Apr 2016
Conference number: 3

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
PublisherSPIE
Volume10009
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceThird European Seminar on Precision Optics Manufacturing
CountryGermany
CityTeisnach
Period12/04/1613/04/16

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Cite this

Faehnle, O., Yu, G., & Walker, D. (2016). Analysis of tool-mass-acceleration effects onto sub-aperture computer controlled polishing (CCP). In R. Rascher, O. Fähnle, C. Wünsche, & C. Schopf (Eds.), Third European Seminar on Precision Optics Manufacturing (Vol. 10009). [1000903] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10009). SPIE. https://doi.org/10.1117/12.2236024