Abstract
In this study, we simulated gas bubble formation in glasses by in-situ ion implantation. Alkali silicate glass and Na-borosilicate glass were implanted in situ with 50 keV Xe ions at temperatures at 200°C in a Hitachi-9000 electron microscope. Bubble formation was studied by transmission electron microscopy images taken during interruptions of the ion beam after discrete implanted-ion dose steps. We present a possible mechanism of bubble formation and growth based on amorphous network structures.
Original language | English |
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Pages (from-to) | 331-336 |
Number of pages | 6 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 540 |
DOIs | |
Publication status | Published - 1 Dec 1998 |
Externally published | Yes |
Event | 1998 MRS Fall Meeting: Symposium N / Microstructural Processes in Irradiated Materials - Boston, United States Duration: 30 Nov 1998 → 3 Dec 1998 |