Bubble formation and growth in glasses

Xidong Chen, Robert C. Birtcher, S. E. Donnelly

Research output: Contribution to journalConference articlepeer-review

2 Citations (Scopus)


In this study, we simulated gas bubble formation in glasses by in-situ ion implantation. Alkali silicate glass and Na-borosilicate glass were implanted in situ with 50 keV Xe ions at temperatures at 200°C in a Hitachi-9000 electron microscope. Bubble formation was studied by transmission electron microscopy images taken during interruptions of the ion beam after discrete implanted-ion dose steps. We present a possible mechanism of bubble formation and growth based on amorphous network structures.

Original languageEnglish
Pages (from-to)331-336
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Publication statusPublished - 1 Dec 1998
Externally publishedYes
Event1998 MRS Fall Meeting: Symposium N / Microstructural Processes in Irradiated Materials - Boston, United States
Duration: 30 Nov 19983 Dec 1998


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