Characterisation of ultra-shallow disorder profiles and dielectric functions in ion implanted Si

I. Mohacsi, P. Petrik, M. Fried, T. Lohner, J. A. Van Den Berg, M. A. Reading, D. Giubertoni, M. Barozzi, A. Parisini

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Ultra-shallow (below 20 nm) disorder profiles have been characterized by spectroscopic ellipsometry (SE). The implanted depth region has been divided into sublayers with dielectric functions calculated by the effective medium approximation using single-crystalline and disordered components. The damage depth profile has been parameterized using a box model, an independent multilayer model, a graded multilayer model, an error function, and Gaussian profiles. Literature values and Tauc-Lorentz (TL) parametrization as well as multi-sample and single-sample approaches have been compared to describe the dielectric function of the disordered component. The distribution of the implanted ions and/or damage have been cross-checked using medium energy ion scattering (MEIS), transmission electron microscopy and Monte Carlo simulations. We found a good agreement in the damage profiles obtained by the different methods. There is an offset between the SE and MEIS damage profiles due to the fact that SE is very sensitive to the surface roughness, in contrast to MEIS. The correlation between this offset and the surface roughness has been investigated using atomic force microscopy.

LanguageEnglish
Pages2847-2851
Number of pages5
JournalThin Solid Films
Volume519
Issue number9
Early online date21 Dec 2010
DOIs
Publication statusPublished - 28 Feb 2011
Externally publishedYes

Fingerprint

Spectroscopic ellipsometry
disorders
Ions
ion scattering
ellipsometry
damage
Scattering
profiles
Multilayers
ions
Surface roughness
surface roughness
error functions
Atomic force microscopy
boxes
energy
Crystalline materials
Transmission electron microscopy
atomic force microscopy
transmission electron microscopy

Cite this

Mohacsi, I. ; Petrik, P. ; Fried, M. ; Lohner, T. ; Van Den Berg, J. A. ; Reading, M. A. ; Giubertoni, D. ; Barozzi, M. ; Parisini, A. / Characterisation of ultra-shallow disorder profiles and dielectric functions in ion implanted Si. In: Thin Solid Films. 2011 ; Vol. 519, No. 9. pp. 2847-2851.
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Mohacsi, I, Petrik, P, Fried, M, Lohner, T, Van Den Berg, JA, Reading, MA, Giubertoni, D, Barozzi, M & Parisini, A 2011, 'Characterisation of ultra-shallow disorder profiles and dielectric functions in ion implanted Si', Thin Solid Films, vol. 519, no. 9, pp. 2847-2851. https://doi.org/10.1016/j.tsf.2010.12.076

Characterisation of ultra-shallow disorder profiles and dielectric functions in ion implanted Si. / Mohacsi, I.; Petrik, P.; Fried, M.; Lohner, T.; Van Den Berg, J. A.; Reading, M. A.; Giubertoni, D.; Barozzi, M.; Parisini, A.

In: Thin Solid Films, Vol. 519, No. 9, 28.02.2011, p. 2847-2851.

Research output: Contribution to journalArticle

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AU - Reading, M. A.

AU - Giubertoni, D.

AU - Barozzi, M.

AU - Parisini, A.

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