Cluster formation during annealing of ultra-low-energy boron-implanted silicon

E. J.H. Collart, A. J. Murrell, M. A. Foad, J. A. Van Den Berg, S. Zhang, D. Armour, R. D. Goldberg, T. S. Wang, A. G. Cullis, T. Clarysse, W. Vandervorst

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