Complementary Metrology within a European Joint Laboratory

A. Nutsch, B. Beckhoff, R. Altmann, J. A. Van Den Berg, D. Giubertoni, P. Hoenicke, M. Bersani, A. Leibold, F. Meirer, M. Mueller, G. Pepponi, M. Otto, P. Petrik, M. Reading, L. Pfitzner, H. Ryssel

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

The continuous dimensional reduction drives the development of metrology, analysis and characterization for nano and micro electronics. An enormous worldwide R&D effort focuses on the understanding and controlling materials properties and dimensions at atomic level. Crucial for groundbreaking new developments is the availability of appropriate analytical infrastructures providing techniques with information depths well adapted to the nanoscaled objects of interest. This requires widely accessible, independent complementary metrology, analytical techniques, and characterization. For example new materials and the demand of improved detection sensitivities for contaminants provide huge challenges for the capabilities of current analysis equipment and expertise. At the same time, the availability of complementary competences is crucial for advancement of analytical methodologies through cross-comparison, round-robin, and benchmarking of results. This paper describes the formation of an independent analytical infrastructure within Europe having the expertise and competence to solve metrology problems for development of nanotechnologies. Furthermore, a strategy is shown to establish independently operating 'Golden Laboratories'(tm) for complementary and reliable metrology, analysis, and characterization adapted to the requirements of industrial partners. 
LanguageEnglish
Pages97-100
Number of pages4
JournalSolid State Phenomena
Volume145-146
DOIs
Publication statusPublished - 6 Jan 2009
Externally publishedYes

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metrology
availability
Availability
Nanoelectronics
Benchmarking
nanotechnology
Nanotechnology
microelectronics
Microelectronics
contaminants
Materials properties
methodology
Impurities
requirements
electronics

Cite this

Nutsch, A., Beckhoff, B., Altmann, R., Van Den Berg, J. A., Giubertoni, D., Hoenicke, P., ... Ryssel, H. (2009). Complementary Metrology within a European Joint Laboratory. Solid State Phenomena, 145-146, 97-100. https://doi.org/10.4028/www.scientific.net/SSP.145-146.97
Nutsch, A. ; Beckhoff, B. ; Altmann, R. ; Van Den Berg, J. A. ; Giubertoni, D. ; Hoenicke, P. ; Bersani, M. ; Leibold, A. ; Meirer, F. ; Mueller, M. ; Pepponi, G. ; Otto, M. ; Petrik, P. ; Reading, M. ; Pfitzner, L. ; Ryssel, H. / Complementary Metrology within a European Joint Laboratory. In: Solid State Phenomena. 2009 ; Vol. 145-146. pp. 97-100.
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Nutsch, A, Beckhoff, B, Altmann, R, Van Den Berg, JA, Giubertoni, D, Hoenicke, P, Bersani, M, Leibold, A, Meirer, F, Mueller, M, Pepponi, G, Otto, M, Petrik, P, Reading, M, Pfitzner, L & Ryssel, H 2009, 'Complementary Metrology within a European Joint Laboratory', Solid State Phenomena, vol. 145-146, pp. 97-100. https://doi.org/10.4028/www.scientific.net/SSP.145-146.97

Complementary Metrology within a European Joint Laboratory. / Nutsch, A.; Beckhoff, B.; Altmann, R.; Van Den Berg, J. A.; Giubertoni, D.; Hoenicke, P.; Bersani, M.; Leibold, A.; Meirer, F.; Mueller, M.; Pepponi, G.; Otto, M.; Petrik, P.; Reading, M.; Pfitzner, L.; Ryssel, H.

In: Solid State Phenomena, Vol. 145-146, 06.01.2009, p. 97-100.

Research output: Contribution to journalArticle

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