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Dislocation-blocking enhancement mechanism in monolayer fullerene/copper composites

Qing Peng, Yuqiang Zhang, Gen Chen, Zeyu Huang, Xintian Cai, Wenhan Zeng, Wenbin Zhong, Zhongwei Hu, Xiao-Jia Chen, Xiangqian Jiang

Research output: Contribution to journalArticlepeer-review

Abstract

The emerging monolayer fullerene (M-C60) offers exceptional multifunctional properties, yet its role in reinforcing copper via dislocation-blocking remains unclear. Using molecular dynamics nanoindentation simulations, we compare single-crystal Cu, graphene/Cu, and M-C60/Cu in surface-coated and embedded configurations. Key findings demonstrate that M-C60 coating enhances hardness by 24.2% via its sp2-sp3 hybrid structure leading to stair-rod/Hirth dislocation multiplication and carbon-chain formation, outperforming graphene's sp2-based mechanisms. Embedded M − C60 absorbs and reflects mobile dislocations, reducing Hirth/Stair-rod dislocations by 54.1% and 16.7% and thereby improving ductility. Compared to graphene, M-C60 exhibits a 26.3% higher interfacial bonding-site density and superior stress buffering, enabling more versatile tuning of strength–ductility tuning. Strain-rate studies reveal that M-C60/Cu retains hardness by resisting brittle fracture and sustaining dislocation loop formation, unlike graphene coatings that fail catastrophically. Elevated-temperature tests show that M-C60 coatings uniquely sustain or increase dislocation density due to strong Cu–C bonding and rough surface morphology, while graphene/Cu softens through dislocation annihilation and reduced twinning. In addition, the hardness-enhancement and dislocation-blocking mechanisms of M-C60 are intrinsic to the material and are not attributable to the indenter characteristics. This work establishes a dislocation-blocking design framework for metal matrix composites, resolving the longstanding strength-ductility trade-off through rational 2D/metal interface engineering.

Original languageEnglish
Article number149883
Number of pages24
JournalMaterials Science and Engineering: A
Volume957
Early online date20 Feb 2026
DOIs
Publication statusPublished - 1 Apr 2026

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