Abstract
The out-of-plane expansion of Copper Through-Silicon-Via (Cu-TSV) is a concern in 3D stacking of chips, since it pushes against the BEOL, thus posing a possible reliability risk. In this study we demonstrate a solution for the Cu-TSV out-of-plane expansion problem resulting in a non-deformed BEOL. This is achieved through gaining a good understanding of the thermo-mechanical behavior of Cu by experiments and adopting this learning in our process flow.
Original language | English |
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Title of host publication | Stress-Induced Phenomena in Metallization |
Subtitle of host publication | Eleventh International Workshop on Stess-Induced Phenomena in Metallization |
Editors | Ehrenfried Zschech, Shinichi Ogawa, Paul S. Ho |
Publisher | AIP Publishing LLC |
Pages | 214-220 |
Number of pages | 7 |
Volume | 1300 |
ISBN (Print) | 9780735408555 |
DOIs | |
Publication status | Published - 24 Nov 2010 |
Externally published | Yes |
Event | 11th International Workshop on Stress-Induced Phenomena in Metallization - Bad Schandau, Germany Duration: 12 Apr 2010 → 14 Apr 2010 Conference number: 11 |
Conference
Conference | 11th International Workshop on Stress-Induced Phenomena in Metallization |
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Country/Territory | Germany |
City | Bad Schandau |
Period | 12/04/10 → 14/04/10 |