Formation of 2-D arrays of semiconductor nanocrystals or semiconductor-rich nanolayers by very low-energy Si or Ge ion implantation in silicon oxide films

Engineering & Materials Science

• Nanocrystals 100%
• Silicon oxides 96%
• Ion implantation 90%
• Oxide films 82%
• Glass transition 76%
• Superconducting transition temperature 72%
• Phase transitions 69%
• Annealing 66%
• Semiconductor materials 59%

Physics & Astronomy

• silicon oxides 70%
• ion implantation 61%
• oxide films 60%
• nanocrystals 59%
• glass transition temperature 31%
• phase transformations 29%
• annealing 20%
• energy 19%