Formation of 2-D arrays of semiconductor nanocrystals or semiconductor-rich nanolayers by very low-energy Si or Ge ion implantation in silicon oxide films

P. Normand, K. Beltsios, E. Kapetanakis, D. Tsoukalas, T. Travlos, J. Stoemenos, J. Van Den Berg, S. Zhang, C. Vieu, H. Launois, J. Gautier, F. Jourdan, L. Palun

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