Fundaments of measurement for computationally-intensive metrology

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Results are presented from a project between European national laboratories (EUROMET), entitled “Traceability for Computationally-Intensive Metrology” (JRP NEW06 (TraCIM)) to demonstrate metrology software is fit for purpose. The paper begins by presenting a new mathematical model for measurement, based on “measurement as an inverse problem” that has consequences for reconstruction algorithms in many modern complex measuring instruments such as CT scanners and white light interferometers. Since metrology software is part of the measuring procedure the “measurement as an inverse problem” model applies and can be used as a foundation to derive properties and build tests for metrology software
Original languageEnglish
Title of host publicationAdvanced mathematical and computational tools in metrology and testing XI
EditorsA Forbes, N Zhang, A Chunovkina, S Eichstadt, F Pavese
PublisherWorld Scientific Publishing Co. Pte Ltd
Pages119-127
Number of pages9
Volume89
ISBN (Electronic)9789813274310
ISBN (Print)9789813274297
DOIs
Publication statusPublished - Dec 2018
EventAdvanced Mathematical and Computational Tools in Metrology and Testing XI - University of Strathclyde, Glasgow, United Kingdom
Duration: 29 Aug 201731 Aug 2017
Conference number: XI
https://enbis.org/rw/articleattachments/617_224_AMCTM2017-Call-for-Papers.pdf (Link to Call for Papers)

Publication series

NameSeries on Advances in Mathematics for Applied Sciences
PublisherWorld Scientific
Volume89
ISSN (Print)1793-0901

Conference

ConferenceAdvanced Mathematical and Computational Tools in Metrology and Testing XI
CountryUnited Kingdom
CityGlasgow
Period29/08/1731/08/17
Internet address

Fingerprint

metrology
computer programs
scanners
mathematical models
interferometers

Cite this

Scott, P. (2018). Fundaments of measurement for computationally-intensive metrology. In A. Forbes, N. Zhang, A. Chunovkina, S. Eichstadt, & F. Pavese (Eds.), Advanced mathematical and computational tools in metrology and testing XI (Vol. 89, pp. 119-127). (Series on Advances in Mathematics for Applied Sciences; Vol. 89). World Scientific Publishing Co. Pte Ltd. https://doi.org/10.1142/9789813274303_0009
Scott, Paul. / Fundaments of measurement for computationally-intensive metrology. Advanced mathematical and computational tools in metrology and testing XI. editor / A Forbes ; N Zhang ; A Chunovkina ; S Eichstadt ; F Pavese. Vol. 89 World Scientific Publishing Co. Pte Ltd, 2018. pp. 119-127 (Series on Advances in Mathematics for Applied Sciences).
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Scott, P 2018, Fundaments of measurement for computationally-intensive metrology. in A Forbes, N Zhang, A Chunovkina, S Eichstadt & F Pavese (eds), Advanced mathematical and computational tools in metrology and testing XI. vol. 89, Series on Advances in Mathematics for Applied Sciences, vol. 89, World Scientific Publishing Co. Pte Ltd, pp. 119-127, Advanced Mathematical and Computational Tools in Metrology and Testing XI, Glasgow, United Kingdom, 29/08/17. https://doi.org/10.1142/9789813274303_0009

Fundaments of measurement for computationally-intensive metrology. / Scott, Paul.

Advanced mathematical and computational tools in metrology and testing XI. ed. / A Forbes; N Zhang; A Chunovkina; S Eichstadt; F Pavese. Vol. 89 World Scientific Publishing Co. Pte Ltd, 2018. p. 119-127 (Series on Advances in Mathematics for Applied Sciences; Vol. 89).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Scott P. Fundaments of measurement for computationally-intensive metrology. In Forbes A, Zhang N, Chunovkina A, Eichstadt S, Pavese F, editors, Advanced mathematical and computational tools in metrology and testing XI. Vol. 89. World Scientific Publishing Co. Pte Ltd. 2018. p. 119-127. (Series on Advances in Mathematics for Applied Sciences). https://doi.org/10.1142/9789813274303_0009