Generic exponential fringe model for alleviating phase error in phase measuring profilometry

Chao Chen, Nan Gao, Xiangjun Wang, Zonghua Zhang, Feng Gao, Xiangqian Jiang

Research output: Contribution to journalArticle

15 Citations (Scopus)


Phase measuring profilometry (PMP) is susceptible to phase error caused by gamma distortion that leads to the captured fringe patterns deviating from ideal sinusoidal waveforms. Existing phase-error compensation methods are generally complex and require significant computational resources for implementation. This paper proposes a generic exponential fringe model expressed as an exponential function of the generated fringe patterns. Based on this model, a straightforward gamma correction method is presented to alleviate phase error without the need for any estimation of nonlinear coefficients or complex calibration. Experimental results demonstrate that the proposed method improves the quality of measurements by suppressing phase error.

Original languageEnglish
Pages (from-to)179-185
Number of pages7
JournalOptics and Lasers in Engineering
Early online date14 Jun 2018
Publication statusPublished - 1 Nov 2018


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