Abstract
Phase measuring profilometry (PMP) is susceptible to phase error caused by gamma distortion that leads to the captured fringe patterns deviating from ideal sinusoidal waveforms. Existing phase-error compensation methods are generally complex and require significant computational resources for implementation. This paper proposes a generic exponential fringe model expressed as an exponential function of the generated fringe patterns. Based on this model, a straightforward gamma correction method is presented to alleviate phase error without the need for any estimation of nonlinear coefficients or complex calibration. Experimental results demonstrate that the proposed method improves the quality of measurements by suppressing phase error.
Original language | English |
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Pages (from-to) | 179-185 |
Number of pages | 7 |
Journal | Optics and Lasers in Engineering |
Volume | 110 |
Early online date | 14 Jun 2018 |
DOIs | |
Publication status | Published - 1 Nov 2018 |
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Feng Gao
- Department of Engineering - Reader
- School of Computing and Engineering
- Centre for Precision Technologies - Member
Person: Academic