Ion-assisted method of deposition was used for production of hard coatings of (Ti1-xCrx)N compounds. Analysis of chemical and phase composition, structure and hardness of films, depending on condition of ion bombardment and deposition, was carried out. The possibility of production of the stoichiometric CrN hard coatings with hardness of 30 GPa was shown. For ternary (Ti1-xCrx)N compounds the dependence of film properties on the content of Cr and Ti was observed and explained. Maximum hardness, more than 30 GPa, for (TiCr2)N coatings has been obtained.
|Number of pages||5|
|Journal||Poverkhnost Rentgenovskie Sinkhronnye i Nejtronnye Issledovaniya|
|Publication status||Published - 2005|