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High depth resolution characterization of the damage and annealing behaviour of ultra shallow As implants in Si
J. A. Van Den Berg, D. G. Armour, M. Werner, S. Whelan, W. Vandervorst, T. Clarysse, E. H.J. Collart, R. D. Goldberg, P. Bailey, T. C.Q. Noakes
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
2
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(Scopus)