Influence of Exposure Energy Control for High Voltage Pulsed Xenon Lamp on the Lithography Accuracy of Linear Grating

Dongxue Ren, Zexiang Zhao, Bin Li, Wenhan Zeng

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this paper, an exposure energy analysis method which affects the precision of incremental grating lithography is proposed. Based on the analysis of the charge and discharge circuit of high voltage pulsed xenon lamp power supply, the change the characteristics of charge and discharge voltage and current circuits is calculated and analyzed by using the Thevenin's basic theorem. The complete charge and discharge voltage, circuit and exposure energy of the pulsed xenon discharge circuit were quantitatively analyzed. The grating energy model and grating fringes were established by calculating the lithography threshold model. Through the example analysis, in order to reduce the influence on the lithography energy, the resistance value of the pulsed xenon lamp should be controlled within 1 Ω, and the error of the exposure time delay is controlled within 2 ms, which provides a theoretical basis for the lithography and control method of high-precision grating scale calculation.
Original languageEnglish
Title of host publication2019 25th International Conference on Automation & Computing (ICAC)
EditorsHui Yu
PublisherIEEE
Pages285-289
Number of pages5
ISBN (Electronic)9781861376657
ISBN (Print)9781728125183
DOIs
Publication statusPublished - 11 Nov 2019
Event25th IEEE International Conference on Automation and Computing: Improving Productivity through Automation and Computing - Lancaster University, Lancaster, United Kingdom
Duration: 5 Sep 20197 Sep 2019
Conference number: 25
http://www.research.lancs.ac.uk/portal/en/activities/25th-ieee-international-conference-on-automation-and-computing-icac19-57-september-2019-lancaster-university-uk(679d94ff-4efb-46b5-9c80-c6d34a13bae4).html

Conference

Conference25th IEEE International Conference on Automation and Computing
Abbreviated titleICAC 2019
CountryUnited Kingdom
CityLancaster
Period5/09/197/09/19
Internet address

Fingerprint

xenon lamps
high voltages
lithography
gratings
energy
electric potential
power supplies
xenon
time lag
theorems
thresholds

Cite this

Ren, D., Zhao, Z., Li, B., & Zeng, W. (2019). Influence of Exposure Energy Control for High Voltage Pulsed Xenon Lamp on the Lithography Accuracy of Linear Grating. In H. Yu (Ed.), 2019 25th International Conference on Automation & Computing (ICAC) (pp. 285-289). [8895223] IEEE. https://doi.org/10.23919/IConAC.2019.8895223
Ren, Dongxue ; Zhao, Zexiang ; Li, Bin ; Zeng, Wenhan. / Influence of Exposure Energy Control for High Voltage Pulsed Xenon Lamp on the Lithography Accuracy of Linear Grating. 2019 25th International Conference on Automation & Computing (ICAC). editor / Hui Yu. IEEE, 2019. pp. 285-289
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title = "Influence of Exposure Energy Control for High Voltage Pulsed Xenon Lamp on the Lithography Accuracy of Linear Grating",
abstract = "In this paper, an exposure energy analysis method which affects the precision of incremental grating lithography is proposed. Based on the analysis of the charge and discharge circuit of high voltage pulsed xenon lamp power supply, the change the characteristics of charge and discharge voltage and current circuits is calculated and analyzed by using the Thevenin's basic theorem. The complete charge and discharge voltage, circuit and exposure energy of the pulsed xenon discharge circuit were quantitatively analyzed. The grating energy model and grating fringes were established by calculating the lithography threshold model. Through the example analysis, in order to reduce the influence on the lithography energy, the resistance value of the pulsed xenon lamp should be controlled within 1 Ω, and the error of the exposure time delay is controlled within 2 ms, which provides a theoretical basis for the lithography and control method of high-precision grating scale calculation.",
keywords = "incremental linear grating, computational lithography, pulsed xenon lamp, linear scale accuracy, lithography energy model, Lithography energy model, Pulsed xenon lamp, Linear scale accuracy, Computational lithography, Incremental linear grating",
author = "Dongxue Ren and Zexiang Zhao and Bin Li and Wenhan Zeng",
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Ren, D, Zhao, Z, Li, B & Zeng, W 2019, Influence of Exposure Energy Control for High Voltage Pulsed Xenon Lamp on the Lithography Accuracy of Linear Grating. in H Yu (ed.), 2019 25th International Conference on Automation & Computing (ICAC)., 8895223, IEEE, pp. 285-289, 25th IEEE International Conference on Automation and Computing, Lancaster, United Kingdom, 5/09/19. https://doi.org/10.23919/IConAC.2019.8895223

Influence of Exposure Energy Control for High Voltage Pulsed Xenon Lamp on the Lithography Accuracy of Linear Grating. / Ren, Dongxue; Zhao, Zexiang; Li, Bin; Zeng, Wenhan.

2019 25th International Conference on Automation & Computing (ICAC). ed. / Hui Yu. IEEE, 2019. p. 285-289 8895223.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Influence of Exposure Energy Control for High Voltage Pulsed Xenon Lamp on the Lithography Accuracy of Linear Grating

AU - Ren, Dongxue

AU - Zhao, Zexiang

AU - Li, Bin

AU - Zeng, Wenhan

PY - 2019/11/11

Y1 - 2019/11/11

N2 - In this paper, an exposure energy analysis method which affects the precision of incremental grating lithography is proposed. Based on the analysis of the charge and discharge circuit of high voltage pulsed xenon lamp power supply, the change the characteristics of charge and discharge voltage and current circuits is calculated and analyzed by using the Thevenin's basic theorem. The complete charge and discharge voltage, circuit and exposure energy of the pulsed xenon discharge circuit were quantitatively analyzed. The grating energy model and grating fringes were established by calculating the lithography threshold model. Through the example analysis, in order to reduce the influence on the lithography energy, the resistance value of the pulsed xenon lamp should be controlled within 1 Ω, and the error of the exposure time delay is controlled within 2 ms, which provides a theoretical basis for the lithography and control method of high-precision grating scale calculation.

AB - In this paper, an exposure energy analysis method which affects the precision of incremental grating lithography is proposed. Based on the analysis of the charge and discharge circuit of high voltage pulsed xenon lamp power supply, the change the characteristics of charge and discharge voltage and current circuits is calculated and analyzed by using the Thevenin's basic theorem. The complete charge and discharge voltage, circuit and exposure energy of the pulsed xenon discharge circuit were quantitatively analyzed. The grating energy model and grating fringes were established by calculating the lithography threshold model. Through the example analysis, in order to reduce the influence on the lithography energy, the resistance value of the pulsed xenon lamp should be controlled within 1 Ω, and the error of the exposure time delay is controlled within 2 ms, which provides a theoretical basis for the lithography and control method of high-precision grating scale calculation.

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KW - linear scale accuracy

KW - lithography energy model

KW - Lithography energy model

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KW - Linear scale accuracy

KW - Computational lithography

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Ren D, Zhao Z, Li B, Zeng W. Influence of Exposure Energy Control for High Voltage Pulsed Xenon Lamp on the Lithography Accuracy of Linear Grating. In Yu H, editor, 2019 25th International Conference on Automation & Computing (ICAC). IEEE. 2019. p. 285-289. 8895223 https://doi.org/10.23919/IConAC.2019.8895223