Interdiffusion in direct ion beam deposited isotopic Fe/Si trilayers

N. D. Telling, C. A. Faunce, M. J. Bonder, P. J. Grundy, D. G. Lord, J. A. Van Den Berg, S. Langridge

Research output: Contribution to journalConference article

10 Citations (Scopus)

Abstract

Interdiffusion and intermixing have been examined in Fe/Si trilayers prepared with ions of different energies, using the direct ion beam deposition technique. Isotope-pure layers were deposited and spin-polarized neutron reflectivity used to determine the role of Fe diffusion in iron silicide formation. It was found that a nonmagnetic iron silicide was formed that contained Fe from both the top and bottom layers in the trilayer, suggesting complete diffusion across the spacer region. Electron microscopy observations revealed the presence of an iron silicide phase and crystalline interface layers in films prepared with low energy ions (30 eV), while mixed and amorphous-like regions were found at higher ion energies (1OO eV).

Original languageEnglish
Pages (from-to)7074-7076
Number of pages3
JournalJournal of Applied Physics
Volume89
Issue number11
DOIs
Publication statusPublished - 1 Jun 2001
Externally publishedYes
Event8th Joint Magnetism and Magnetic Materials - San Antonio, United States
Duration: 7 Jan 200111 Jan 2001
Conference number: 8

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    Telling, N. D., Faunce, C. A., Bonder, M. J., Grundy, P. J., Lord, D. G., Van Den Berg, J. A., & Langridge, S. (2001). Interdiffusion in direct ion beam deposited isotopic Fe/Si trilayers. Journal of Applied Physics, 89(11), 7074-7076. https://doi.org/10.1063/1.1357151