Investigations on the characterization of ion implanted hexagonal boron nitride

E. Aradi, S. R. Naidoo, R. M. Erasmus, B. Julies, T. E. Derry

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

The effect of ion implantation on hexagonal boron nitride (h-BN) is studied herein. We use boron as an ion of choice to introduce radiation damage into h-BN, at fluences ranging from 1 1014-1 1016 ions/cm2 and implantation energy ranges from 40 to 160 keV. The thermal dependence is also investigated by varying the annealing temperature from room temperature to 400 °C after implantation. Raman spectroscopy showed Raman active defects one of which is possibly related to the formation of cubic boron nitride nanocrystals (nc-BN) within the implanted range. The relationship of these defect induced Raman active peaks was investigated by varying the implantation parameters. The preliminary Transmission Electron Microscopy (TEM) results also are reported briefly.

LanguageEnglish
Pages214-217
Number of pages4
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume307
Early online date25 Jan 2013
DOIs
Publication statusPublished - 15 Jul 2013
Externally publishedYes

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Boron nitride
boron nitrides
Ion implantation
implantation
Cubic boron nitride
Defects
Radiation damage
Ions
Nanocrystals
Boron
Raman spectroscopy
ions
defects
Annealing
Transmission electron microscopy
radiation damage
Temperature
ion implantation
nanocrystals
fluence

Cite this

@article{9968ff6238234be68faebb7f15782726,
title = "Investigations on the characterization of ion implanted hexagonal boron nitride",
abstract = "The effect of ion implantation on hexagonal boron nitride (h-BN) is studied herein. We use boron as an ion of choice to introduce radiation damage into h-BN, at fluences ranging from 1 1014-1 1016 ions/cm2 and implantation energy ranges from 40 to 160 keV. The thermal dependence is also investigated by varying the annealing temperature from room temperature to 400 °C after implantation. Raman spectroscopy showed Raman active defects one of which is possibly related to the formation of cubic boron nitride nanocrystals (nc-BN) within the implanted range. The relationship of these defect induced Raman active peaks was investigated by varying the implantation parameters. The preliminary Transmission Electron Microscopy (TEM) results also are reported briefly.",
keywords = "Boron nitride, Ion implantation, Raman spectroscopy, Transmission electron microscopy",
author = "E. Aradi and Naidoo, {S. R.} and Erasmus, {R. M.} and B. Julies and Derry, {T. E.}",
year = "2013",
month = "7",
day = "15",
doi = "10.1016/j.nimb.2012.12.118",
language = "English",
volume = "307",
pages = "214--217",
journal = "Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms",
issn = "0168-583X",
publisher = "Elsevier",

}

Investigations on the characterization of ion implanted hexagonal boron nitride. / Aradi, E.; Naidoo, S. R.; Erasmus, R. M.; Julies, B.; Derry, T. E.

In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 307, 15.07.2013, p. 214-217.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Investigations on the characterization of ion implanted hexagonal boron nitride

AU - Aradi, E.

AU - Naidoo, S. R.

AU - Erasmus, R. M.

AU - Julies, B.

AU - Derry, T. E.

PY - 2013/7/15

Y1 - 2013/7/15

N2 - The effect of ion implantation on hexagonal boron nitride (h-BN) is studied herein. We use boron as an ion of choice to introduce radiation damage into h-BN, at fluences ranging from 1 1014-1 1016 ions/cm2 and implantation energy ranges from 40 to 160 keV. The thermal dependence is also investigated by varying the annealing temperature from room temperature to 400 °C after implantation. Raman spectroscopy showed Raman active defects one of which is possibly related to the formation of cubic boron nitride nanocrystals (nc-BN) within the implanted range. The relationship of these defect induced Raman active peaks was investigated by varying the implantation parameters. The preliminary Transmission Electron Microscopy (TEM) results also are reported briefly.

AB - The effect of ion implantation on hexagonal boron nitride (h-BN) is studied herein. We use boron as an ion of choice to introduce radiation damage into h-BN, at fluences ranging from 1 1014-1 1016 ions/cm2 and implantation energy ranges from 40 to 160 keV. The thermal dependence is also investigated by varying the annealing temperature from room temperature to 400 °C after implantation. Raman spectroscopy showed Raman active defects one of which is possibly related to the formation of cubic boron nitride nanocrystals (nc-BN) within the implanted range. The relationship of these defect induced Raman active peaks was investigated by varying the implantation parameters. The preliminary Transmission Electron Microscopy (TEM) results also are reported briefly.

KW - Boron nitride

KW - Ion implantation

KW - Raman spectroscopy

KW - Transmission electron microscopy

UR - http://www.scopus.com/inward/record.url?scp=84885171813&partnerID=8YFLogxK

UR - https://www.journals.elsevier.com/nuclear-instruments-and-methods-in-physics-research-section-b-beam-interactions-with-materials-and-atoms

U2 - 10.1016/j.nimb.2012.12.118

DO - 10.1016/j.nimb.2012.12.118

M3 - Article

VL - 307

SP - 214

EP - 217

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

T2 - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

SN - 0168-583X

ER -