Microstructural origins of the high mechanical damage tolerance of NbTaMoW refractory high-entropy alloy thin films

Matheus Araujo Tunes, Vlad Vishnyakov

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Refractory NbTaMoW thin films in close to equiatomic composition were deposited by ion beam sputter-deposition at room temperature. Energy-filtered transmission electron microscopy shows uniform distribution of all elements and electron diffraction patterns reveals unvarying body-centred cubic crystalline structure. Transmission electron microscopy images show large grains with columnar morphology. Ar bubbles with diameters around of 1.3 ± 0.4 nm were witnessed. The film growth mechanisms are discussed based on high-entropy film nature, general nucleation and growth theory and the Movchan-Demchishin-Thornton structure-zone growth models. Nanoindentation showed that the films have hardness of 22.8 ± 0.7 GPa. Nanoscratching demonstrated that such high hardness is also connected with high crack and delamination resistances. This indicates high mechanical damage tolerance (e.g. toughness). The results show that the combination of refractory metals with the intrinsic characteristics of high-entropy alloy systems in the NbTaMoW case can be considered as a hard coating candidate for future application in extreme environments.

Original languageEnglish
Article number107692
JournalMaterials and Design
Volume170
Early online date9 Mar 2019
DOIs
Publication statusPublished - 15 May 2019

Fingerprint

Damage tolerance
Refractory materials
Entropy
Hardness
Transmission electron microscopy
Thin films
Refractory metals
Hard coatings
Sputter deposition
Film growth
Nanoindentation
Delamination
Electron diffraction
Diffraction patterns
Ion beams
Toughness
Nucleation
Crystalline materials
Cracks
Chemical analysis

Cite this

@article{ba86f6dea64c4098a74114c72a556cbd,
title = "Microstructural origins of the high mechanical damage tolerance of NbTaMoW refractory high-entropy alloy thin films",
abstract = "Refractory NbTaMoW thin films in close to equiatomic composition were deposited by ion beam sputter-deposition at room temperature. Energy-filtered transmission electron microscopy shows uniform distribution of all elements and electron diffraction patterns reveals unvarying body-centred cubic crystalline structure. Transmission electron microscopy images show large grains with columnar morphology. Ar bubbles with diameters around of 1.3 ± 0.4 nm were witnessed. The film growth mechanisms are discussed based on high-entropy film nature, general nucleation and growth theory and the Movchan-Demchishin-Thornton structure-zone growth models. Nanoindentation showed that the films have hardness of 22.8 ± 0.7 GPa. Nanoscratching demonstrated that such high hardness is also connected with high crack and delamination resistances. This indicates high mechanical damage tolerance (e.g. toughness). The results show that the combination of refractory metals with the intrinsic characteristics of high-entropy alloy systems in the NbTaMoW case can be considered as a hard coating candidate for future application in extreme environments.",
keywords = "Energy filtered transmission electron microscopy, Nanoindentation, Nanoscratching, Refractory high-entropy alloys, Thin films, Transmission electron microscopy",
author = "Tunes, {Matheus Araujo} and Vlad Vishnyakov",
year = "2019",
month = "5",
day = "15",
doi = "10.1016/j.matdes.2019.107692",
language = "English",
volume = "170",
journal = "Materials and Design",
issn = "0264-1275",
publisher = "Elsevier",

}

Microstructural origins of the high mechanical damage tolerance of NbTaMoW refractory high-entropy alloy thin films. / Tunes, Matheus Araujo; Vishnyakov, Vlad.

In: Materials and Design, Vol. 170, 107692, 15.05.2019.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Microstructural origins of the high mechanical damage tolerance of NbTaMoW refractory high-entropy alloy thin films

AU - Tunes, Matheus Araujo

AU - Vishnyakov, Vlad

PY - 2019/5/15

Y1 - 2019/5/15

N2 - Refractory NbTaMoW thin films in close to equiatomic composition were deposited by ion beam sputter-deposition at room temperature. Energy-filtered transmission electron microscopy shows uniform distribution of all elements and electron diffraction patterns reveals unvarying body-centred cubic crystalline structure. Transmission electron microscopy images show large grains with columnar morphology. Ar bubbles with diameters around of 1.3 ± 0.4 nm were witnessed. The film growth mechanisms are discussed based on high-entropy film nature, general nucleation and growth theory and the Movchan-Demchishin-Thornton structure-zone growth models. Nanoindentation showed that the films have hardness of 22.8 ± 0.7 GPa. Nanoscratching demonstrated that such high hardness is also connected with high crack and delamination resistances. This indicates high mechanical damage tolerance (e.g. toughness). The results show that the combination of refractory metals with the intrinsic characteristics of high-entropy alloy systems in the NbTaMoW case can be considered as a hard coating candidate for future application in extreme environments.

AB - Refractory NbTaMoW thin films in close to equiatomic composition were deposited by ion beam sputter-deposition at room temperature. Energy-filtered transmission electron microscopy shows uniform distribution of all elements and electron diffraction patterns reveals unvarying body-centred cubic crystalline structure. Transmission electron microscopy images show large grains with columnar morphology. Ar bubbles with diameters around of 1.3 ± 0.4 nm were witnessed. The film growth mechanisms are discussed based on high-entropy film nature, general nucleation and growth theory and the Movchan-Demchishin-Thornton structure-zone growth models. Nanoindentation showed that the films have hardness of 22.8 ± 0.7 GPa. Nanoscratching demonstrated that such high hardness is also connected with high crack and delamination resistances. This indicates high mechanical damage tolerance (e.g. toughness). The results show that the combination of refractory metals with the intrinsic characteristics of high-entropy alloy systems in the NbTaMoW case can be considered as a hard coating candidate for future application in extreme environments.

KW - Energy filtered transmission electron microscopy

KW - Nanoindentation

KW - Nanoscratching

KW - Refractory high-entropy alloys

KW - Thin films

KW - Transmission electron microscopy

UR - http://www.scopus.com/inward/record.url?scp=85063885293&partnerID=8YFLogxK

U2 - 10.1016/j.matdes.2019.107692

DO - 10.1016/j.matdes.2019.107692

M3 - Article

VL - 170

JO - Materials and Design

JF - Materials and Design

SN - 0264-1275

M1 - 107692

ER -