Novel hybrid stylus for nanometric profilometry for large optical surfaces

David Walker, Ho Soon Yang, Sug Whan Kim

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

We report a new plunger and pivot hybrid stylus system suitable for point-by-point form measurement for large optical surfaces up to 1m in diameter. The geometric stylus model was established to predict the height measurement error. The 'Height Difference Variation (HDV)' technique was developed for minimizing the stylus pivot motion error. The laboratory stylus system exhibited the repeatability of less than 10 nm for up to 8.1 degrees in slope and the form departure of 26 nm from the calibration sphere. The hybrid stylus may offer an efficient form metrology solution to the mass production of optical surfaces of 1-2m in diameter.

LanguageEnglish
Pages1793-1798
Number of pages6
JournalOptics Express
Volume11
Issue number15
DOIs
Publication statusPublished - 28 Jul 2003
Externally publishedYes

Fingerprint

pivots
plungers
metrology
slopes

Cite this

Walker, David ; Yang, Ho Soon ; Kim, Sug Whan. / Novel hybrid stylus for nanometric profilometry for large optical surfaces. In: Optics Express. 2003 ; Vol. 11, No. 15. pp. 1793-1798.
@article{7a116fa8a9274c3e8d0f4b5e6ae6f303,
title = "Novel hybrid stylus for nanometric profilometry for large optical surfaces",
abstract = "We report a new plunger and pivot hybrid stylus system suitable for point-by-point form measurement for large optical surfaces up to 1m in diameter. The geometric stylus model was established to predict the height measurement error. The 'Height Difference Variation (HDV)' technique was developed for minimizing the stylus pivot motion error. The laboratory stylus system exhibited the repeatability of less than 10 nm for up to 8.1 degrees in slope and the form departure of 26 nm from the calibration sphere. The hybrid stylus may offer an efficient form metrology solution to the mass production of optical surfaces of 1-2m in diameter.",
author = "David Walker and Yang, {Ho Soon} and Kim, {Sug Whan}",
year = "2003",
month = "7",
day = "28",
doi = "10.1364/OE.11.001793",
language = "English",
volume = "11",
pages = "1793--1798",
journal = "Optics Express",
issn = "1094-4087",
publisher = "The Optical Society",
number = "15",

}

Novel hybrid stylus for nanometric profilometry for large optical surfaces. / Walker, David; Yang, Ho Soon; Kim, Sug Whan.

In: Optics Express, Vol. 11, No. 15, 28.07.2003, p. 1793-1798.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Novel hybrid stylus for nanometric profilometry for large optical surfaces

AU - Walker, David

AU - Yang, Ho Soon

AU - Kim, Sug Whan

PY - 2003/7/28

Y1 - 2003/7/28

N2 - We report a new plunger and pivot hybrid stylus system suitable for point-by-point form measurement for large optical surfaces up to 1m in diameter. The geometric stylus model was established to predict the height measurement error. The 'Height Difference Variation (HDV)' technique was developed for minimizing the stylus pivot motion error. The laboratory stylus system exhibited the repeatability of less than 10 nm for up to 8.1 degrees in slope and the form departure of 26 nm from the calibration sphere. The hybrid stylus may offer an efficient form metrology solution to the mass production of optical surfaces of 1-2m in diameter.

AB - We report a new plunger and pivot hybrid stylus system suitable for point-by-point form measurement for large optical surfaces up to 1m in diameter. The geometric stylus model was established to predict the height measurement error. The 'Height Difference Variation (HDV)' technique was developed for minimizing the stylus pivot motion error. The laboratory stylus system exhibited the repeatability of less than 10 nm for up to 8.1 degrees in slope and the form departure of 26 nm from the calibration sphere. The hybrid stylus may offer an efficient form metrology solution to the mass production of optical surfaces of 1-2m in diameter.

UR - http://www.scopus.com/inward/record.url?scp=2942707761&partnerID=8YFLogxK

U2 - 10.1364/OE.11.001793

DO - 10.1364/OE.11.001793

M3 - Article

VL - 11

SP - 1793

EP - 1798

JO - Optics Express

T2 - Optics Express

JF - Optics Express

SN - 1094-4087

IS - 15

ER -