Numerical Solution to the General One-Dimensional Diffusion Equation in Semiconductor Heterostructures

Chemistry

• Diffusion Coefficient 66%
• Ion Implantation 62%
• Semiconductor 58%
• Diffusion 47%
• Superlattice 26%
• Annealing 20%
• Photoluminescence 19%
• Time 18%

Engineering & Materials Science

• Heterojunctions 100%
• Semiconductor materials 67%
• Semiconductor quantum wells 39%
• Ion implantation 34%
• Photoluminescence 20%
• Radiation damage 19%
• Annealing 12%
• Hot Temperature 6%
• Temperature 5%

Physics & Astronomy

• diffusion coefficient 62%
• ion implantation 46%
• quantum wells 39%
• versatility 28%
• radiation damage 26%
• photoluminescence 17%
• annealing 15%
• profiles 13%