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Oxygen plasma cleaning of copper for photocathode applications: A MEIS and XPS study
T. C.Q. Noakes, R. Valizadeh, A. N. Hannah, L. B. Jones, B. L. Militsyn, S. Mistry, M. D. Cropper, A. Rossall, J. A. Van den Berg
Research output: Contribution to journal › Article › peer-review
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(Scopus)