Particle energy loss spectroscopy and SEM studies of topography development in thin aluminium films implanted with high doses of helium

KM Barfoot, RP Webb, SE Donnelly

Research output: Contribution to journalArticle

Abstract

Development of topography in thin (55.5 μg cm-2) self-supporting aluminium films, caused by high fluence (∼1017 ions cm-2)irradiation with 5 keV helium ions, has been observed. This has been achieved by measuring the topography-enhanced energy straggling of 0.40 MeV4He+ ions transmitted through the foils and detected with an electrostatic analyser of resolution 0.2 keV. Features, about 0.7 μm in width, are observed with scanning electron microscopy. TRIM Monte Carlo calculations of the implantation processes are performed in order to follow the helium implantation and damage depth distributions. It is deduced that a form of thin film micro-wrinkling has occurred which is caused by the relief of stress brought about by the implantation of helium.

LanguageEnglish
Pages825-829
Number of pages5
JournalVacuum
Volume34
Issue number10-11
DOIs
Publication statusPublished - 1 Oct 1984
Externally publishedYes

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Helium
Aluminum
particle energy
Topography
implantation
Energy dissipation
topography
energy dissipation
helium
Spectroscopy
Ions
aluminum
dosage
Scanning electron microscopy
scanning electron microscopy
spectroscopy
wrinkling
helium ions
Metal foil
Electrostatics

Cite this

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title = "Particle energy loss spectroscopy and SEM studies of topography development in thin aluminium films implanted with high doses of helium",
abstract = "Development of topography in thin (55.5 μg cm-2) self-supporting aluminium films, caused by high fluence (∼1017 ions cm-2)irradiation with 5 keV helium ions, has been observed. This has been achieved by measuring the topography-enhanced energy straggling of 0.40 MeV4He+ ions transmitted through the foils and detected with an electrostatic analyser of resolution 0.2 keV. Features, about 0.7 μm in width, are observed with scanning electron microscopy. TRIM Monte Carlo calculations of the implantation processes are performed in order to follow the helium implantation and damage depth distributions. It is deduced that a form of thin film micro-wrinkling has occurred which is caused by the relief of stress brought about by the implantation of helium.",
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Particle energy loss spectroscopy and SEM studies of topography development in thin aluminium films implanted with high doses of helium. / Barfoot, KM; Webb, RP; Donnelly, SE.

In: Vacuum, Vol. 34, No. 10-11, 01.10.1984, p. 825-829.

Research output: Contribution to journalArticle

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T1 - Particle energy loss spectroscopy and SEM studies of topography development in thin aluminium films implanted with high doses of helium

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AU - Webb, RP

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