Particle energy loss spectroscopy and SEM studies of topography development in thin aluminium films implanted with high doses of helium

KM Barfoot, RP Webb, SE Donnelly

Research output: Contribution to journalArticle

Abstract

Development of topography in thin (55.5 μg cm-2) self-supporting aluminium films, caused by high fluence (∼1017 ions cm-2)irradiation with 5 keV helium ions, has been observed. This has been achieved by measuring the topography-enhanced energy straggling of 0.40 MeV4He+ ions transmitted through the foils and detected with an electrostatic analyser of resolution 0.2 keV. Features, about 0.7 μm in width, are observed with scanning electron microscopy. TRIM Monte Carlo calculations of the implantation processes are performed in order to follow the helium implantation and damage depth distributions. It is deduced that a form of thin film micro-wrinkling has occurred which is caused by the relief of stress brought about by the implantation of helium.

Original languageEnglish
Pages (from-to)825-829
Number of pages5
JournalVacuum
Volume34
Issue number10-11
DOIs
Publication statusPublished - 1 Oct 1984
Externally publishedYes

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