Photolithographically Manufactured Acrylate Polymer Multimode Optical Waveguide Loss Design Rules

Kai Wang, David R. Selviah, Ioannis Papakonstantinou, Guoyu Yu, Hadi Baghsiahi, F. Anibal Fernández

Research output: Chapter in Book/Report/Conference proceedingConference contribution

14 Citations (Scopus)

Abstract

This paper describes how design rules are established for photolithographically manufactured acrylate polymer optical multimode waveguide components by optical experimental measurements made on the manufactured waveguide component. The loss of individual waveguide components, such as straight sections, 90° bends, crossings, tapers and tapered bends must be known so that the combined loss of a cascade of such elements can be found to determine whether the interconnection's optical power budget is sufficient to achieve a good bit error rate. However, the loss depends on several factors: the materials: the polymer used for the core and for the cladding, the fabrication technique: e.g. the photolithographic procedure and the precise temperature baking regime used, and the measurement technique: the optical source lateral size and angular divergence and precise position relative to the entrance of the waveguide, the output detector lateral size, its angular acceptance angle (if any) and its precise position relative to the exit of the waveguide. The experiments reported on photolithographically manufactured acrylate polymer multimode waveguide were performed at room temperature. A new technique for measure the transmitted power at waveguide crossings is reported for the first time.

Original languageEnglish
Title of host publication2008 2nd Electronics System-Integration Technology Conference
PublisherIEEE
Pages1251-1255
Number of pages5
Volume2
ISBN (Electronic)9781424428144
ISBN (Print)9781424428137
DOIs
Publication statusPublished - 21 Nov 2008
Externally publishedYes
Event2008 2nd Electronics Systemintegration Technology Conference - Greenwich, United Kingdom
Duration: 1 Sep 20084 Sep 2008

Conference

Conference2008 2nd Electronics Systemintegration Technology Conference
Abbreviated titleESTC
CountryUnited Kingdom
CityGreenwich
Period1/09/084/09/08

Fingerprint

Electric losses
Waveguide components
Optical waveguides
Waveguides
Polymers
Optical interconnects
Bit error rate
Light sources
Detectors
Fabrication
Temperature
Experiments

Cite this

Wang, K., Selviah, D. R., Papakonstantinou, I., Yu, G., Baghsiahi, H., & Fernández, F. A. (2008). Photolithographically Manufactured Acrylate Polymer Multimode Optical Waveguide Loss Design Rules. In 2008 2nd Electronics System-Integration Technology Conference (Vol. 2, pp. 1251-1255). [4684533] IEEE. https://doi.org/10.1109/ESTC.2008.4684533
Wang, Kai ; Selviah, David R. ; Papakonstantinou, Ioannis ; Yu, Guoyu ; Baghsiahi, Hadi ; Fernández, F. Anibal. / Photolithographically Manufactured Acrylate Polymer Multimode Optical Waveguide Loss Design Rules. 2008 2nd Electronics System-Integration Technology Conference. Vol. 2 IEEE, 2008. pp. 1251-1255
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abstract = "This paper describes how design rules are established for photolithographically manufactured acrylate polymer optical multimode waveguide components by optical experimental measurements made on the manufactured waveguide component. The loss of individual waveguide components, such as straight sections, 90° bends, crossings, tapers and tapered bends must be known so that the combined loss of a cascade of such elements can be found to determine whether the interconnection's optical power budget is sufficient to achieve a good bit error rate. However, the loss depends on several factors: the materials: the polymer used for the core and for the cladding, the fabrication technique: e.g. the photolithographic procedure and the precise temperature baking regime used, and the measurement technique: the optical source lateral size and angular divergence and precise position relative to the entrance of the waveguide, the output detector lateral size, its angular acceptance angle (if any) and its precise position relative to the exit of the waveguide. The experiments reported on photolithographically manufactured acrylate polymer multimode waveguide were performed at room temperature. A new technique for measure the transmitted power at waveguide crossings is reported for the first time.",
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Wang, K, Selviah, DR, Papakonstantinou, I, Yu, G, Baghsiahi, H & Fernández, FA 2008, Photolithographically Manufactured Acrylate Polymer Multimode Optical Waveguide Loss Design Rules. in 2008 2nd Electronics System-Integration Technology Conference. vol. 2, 4684533, IEEE, pp. 1251-1255, 2008 2nd Electronics Systemintegration Technology Conference, Greenwich, United Kingdom, 1/09/08. https://doi.org/10.1109/ESTC.2008.4684533

Photolithographically Manufactured Acrylate Polymer Multimode Optical Waveguide Loss Design Rules. / Wang, Kai; Selviah, David R.; Papakonstantinou, Ioannis; Yu, Guoyu; Baghsiahi, Hadi; Fernández, F. Anibal.

2008 2nd Electronics System-Integration Technology Conference. Vol. 2 IEEE, 2008. p. 1251-1255 4684533.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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AU - Fernández, F. Anibal

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N2 - This paper describes how design rules are established for photolithographically manufactured acrylate polymer optical multimode waveguide components by optical experimental measurements made on the manufactured waveguide component. The loss of individual waveguide components, such as straight sections, 90° bends, crossings, tapers and tapered bends must be known so that the combined loss of a cascade of such elements can be found to determine whether the interconnection's optical power budget is sufficient to achieve a good bit error rate. However, the loss depends on several factors: the materials: the polymer used for the core and for the cladding, the fabrication technique: e.g. the photolithographic procedure and the precise temperature baking regime used, and the measurement technique: the optical source lateral size and angular divergence and precise position relative to the entrance of the waveguide, the output detector lateral size, its angular acceptance angle (if any) and its precise position relative to the exit of the waveguide. The experiments reported on photolithographically manufactured acrylate polymer multimode waveguide were performed at room temperature. A new technique for measure the transmitted power at waveguide crossings is reported for the first time.

AB - This paper describes how design rules are established for photolithographically manufactured acrylate polymer optical multimode waveguide components by optical experimental measurements made on the manufactured waveguide component. The loss of individual waveguide components, such as straight sections, 90° bends, crossings, tapers and tapered bends must be known so that the combined loss of a cascade of such elements can be found to determine whether the interconnection's optical power budget is sufficient to achieve a good bit error rate. However, the loss depends on several factors: the materials: the polymer used for the core and for the cladding, the fabrication technique: e.g. the photolithographic procedure and the precise temperature baking regime used, and the measurement technique: the optical source lateral size and angular divergence and precise position relative to the entrance of the waveguide, the output detector lateral size, its angular acceptance angle (if any) and its precise position relative to the exit of the waveguide. The experiments reported on photolithographically manufactured acrylate polymer multimode waveguide were performed at room temperature. A new technique for measure the transmitted power at waveguide crossings is reported for the first time.

KW - Optical Polymers

KW - Optical waveguides

KW - Optical Losses

KW - Optical design

KW - Optical waveguide components

KW - Pulp manufacturing

KW - Optical interconnections

KW - Bit error rate

KW - Optical materials

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SN - 9781424428137

VL - 2

SP - 1251

EP - 1255

BT - 2008 2nd Electronics System-Integration Technology Conference

PB - IEEE

ER -

Wang K, Selviah DR, Papakonstantinou I, Yu G, Baghsiahi H, Fernández FA. Photolithographically Manufactured Acrylate Polymer Multimode Optical Waveguide Loss Design Rules. In 2008 2nd Electronics System-Integration Technology Conference. Vol. 2. IEEE. 2008. p. 1251-1255. 4684533 https://doi.org/10.1109/ESTC.2008.4684533