Recent developments in nuclear methods in support of semiconductor characterization

B. Brijs, H. Bender, C. Huyghebaert, T. Janssens, W. Vandervorst, K. Nakajima, K. Kimura, A. Bergmaier, G. Dollinger, J. A. Van den Berg

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The analysis of thin materials related to semiconductors using nuclear techniques was presented. Decreasing the beam energy from the conventional energy of 2 MeV to lower than 0.5 MeV or lower transforms rutherford backscattering (RBS) to a near surface analysis technique. It was concluded that problems of material characterization could be solved using secondary ion mass spectrometry (SIMS) and dedicated nuclear techniques that provide good insight in the material behavior in shallow layers.

Original languageEnglish
Title of host publicationAnalytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes
Subtitle of host publicationJoint Proceedings of the Symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and The 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah
EditorsBernd O. Kolbesen, Cor Claeys, Peter Stallhofer, Francois Tardif, Dieter K. Schroder, Thomas J. Shaffner, Michio Tajima, P. Rai-Choudhury
PublisherThe Electrochemical Society
Pages50-62
Number of pages13
ISBN (Print)9781566773485, 081949997, 1566773482
Publication statusPublished - 2003
Externally publishedYes
EventAnalytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes - Salt Lake City, United States
Duration: 21 Oct 200225 Oct 2002
https://www.tib.eu/en/search/id/BLCP%3ACN048933622/Recent-Developments-in-Nuclear-Methods-in-Support/

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
PublisherSPIE
Volume5133
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceAnalytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes
CountryUnited States
CitySalt Lake City
Period21/10/0225/10/02
Internet address

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  • Cite this

    Brijs, B., Bender, H., Huyghebaert, C., Janssens, T., Vandervorst, W., Nakajima, K., Kimura, K., Bergmaier, A., Dollinger, G., & Van den Berg, J. A. (2003). Recent developments in nuclear methods in support of semiconductor characterization. In B. O. Kolbesen, C. Claeys, P. Stallhofer, F. Tardif, D. K. Schroder, T. J. Shaffner, M. Tajima, & P. Rai-Choudhury (Eds.), Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes: Joint Proceedings of the Symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and The 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah (pp. 50-62). (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 5133). The Electrochemical Society.