Self-assembled hexagonal ordering of Si nanocrystals embedded in SiO2nanodots

A. G. Nassiopoulou, V. V. Gianneta, M. Huffman, M. A. Reading, J. A. Van Den Berg, I. Tsiaoussis, N. Frangis

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Highly dense hexagonally ordered two-dimensional arrays of Si nanocrystals embedded in SiO2nanodots were fabricated on a silicon substrate by using a self-assembled porous anodic alumina thin film as a masking layer through which electrochemical oxidation of the Si substrate and ultralow energy Si implantation took place. After removal of the alumina film and high temperature annealing of the samples, hexagonally ordered Si nanocrystals embedded within SiO2nanodots were obtained, having sizes in the few tens of nanometer range. The fabricated ordered structures show significant potential for applications either in basic physics experiments or as building blocks for nanoelectronic and nanophotonic devices.
LanguageEnglish
Article number495605
JournalNanotechnology
Volume19
Issue number49
DOIs
Publication statusPublished - 19 Nov 2008
Externally publishedYes

Fingerprint

Aluminum Oxide
Nanocrystals
Alumina
Nanophotonics
Nanoelectronics
Electrochemical oxidation
Silicon
Substrates
Ion implantation
Physics
Annealing
Thin films
Experiments
Temperature

Cite this

Nassiopoulou, A. G., Gianneta, V. V., Huffman, M., Reading, M. A., Van Den Berg, J. A., Tsiaoussis, I., & Frangis, N. (2008). Self-assembled hexagonal ordering of Si nanocrystals embedded in SiO2nanodots. Nanotechnology, 19(49), [495605]. https://doi.org/10.1088/0957-4484/19/49/495605
Nassiopoulou, A. G. ; Gianneta, V. V. ; Huffman, M. ; Reading, M. A. ; Van Den Berg, J. A. ; Tsiaoussis, I. ; Frangis, N. / Self-assembled hexagonal ordering of Si nanocrystals embedded in SiO2nanodots. In: Nanotechnology. 2008 ; Vol. 19, No. 49.
@article{4f32d92a09664a4f81b6f869cb3c616d,
title = "Self-assembled hexagonal ordering of Si nanocrystals embedded in SiO2nanodots",
abstract = "Highly dense hexagonally ordered two-dimensional arrays of Si nanocrystals embedded in SiO2nanodots were fabricated on a silicon substrate by using a self-assembled porous anodic alumina thin film as a masking layer through which electrochemical oxidation of the Si substrate and ultralow energy Si implantation took place. After removal of the alumina film and high temperature annealing of the samples, hexagonally ordered Si nanocrystals embedded within SiO2nanodots were obtained, having sizes in the few tens of nanometer range. The fabricated ordered structures show significant potential for applications either in basic physics experiments or as building blocks for nanoelectronic and nanophotonic devices.",
author = "Nassiopoulou, {A. G.} and Gianneta, {V. V.} and M. Huffman and Reading, {M. A.} and {Van Den Berg}, {J. A.} and I. Tsiaoussis and N. Frangis",
year = "2008",
month = "11",
day = "19",
doi = "10.1088/0957-4484/19/49/495605",
language = "English",
volume = "19",
journal = "Nanotechnology",
issn = "0957-4484",
publisher = "IOP Publishing Ltd.",
number = "49",

}

Nassiopoulou, AG, Gianneta, VV, Huffman, M, Reading, MA, Van Den Berg, JA, Tsiaoussis, I & Frangis, N 2008, 'Self-assembled hexagonal ordering of Si nanocrystals embedded in SiO2nanodots', Nanotechnology, vol. 19, no. 49, 495605. https://doi.org/10.1088/0957-4484/19/49/495605

Self-assembled hexagonal ordering of Si nanocrystals embedded in SiO2nanodots. / Nassiopoulou, A. G.; Gianneta, V. V.; Huffman, M.; Reading, M. A.; Van Den Berg, J. A.; Tsiaoussis, I.; Frangis, N.

In: Nanotechnology, Vol. 19, No. 49, 495605, 19.11.2008.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Self-assembled hexagonal ordering of Si nanocrystals embedded in SiO2nanodots

AU - Nassiopoulou, A. G.

AU - Gianneta, V. V.

AU - Huffman, M.

AU - Reading, M. A.

AU - Van Den Berg, J. A.

AU - Tsiaoussis, I.

AU - Frangis, N.

PY - 2008/11/19

Y1 - 2008/11/19

N2 - Highly dense hexagonally ordered two-dimensional arrays of Si nanocrystals embedded in SiO2nanodots were fabricated on a silicon substrate by using a self-assembled porous anodic alumina thin film as a masking layer through which electrochemical oxidation of the Si substrate and ultralow energy Si implantation took place. After removal of the alumina film and high temperature annealing of the samples, hexagonally ordered Si nanocrystals embedded within SiO2nanodots were obtained, having sizes in the few tens of nanometer range. The fabricated ordered structures show significant potential for applications either in basic physics experiments or as building blocks for nanoelectronic and nanophotonic devices.

AB - Highly dense hexagonally ordered two-dimensional arrays of Si nanocrystals embedded in SiO2nanodots were fabricated on a silicon substrate by using a self-assembled porous anodic alumina thin film as a masking layer through which electrochemical oxidation of the Si substrate and ultralow energy Si implantation took place. After removal of the alumina film and high temperature annealing of the samples, hexagonally ordered Si nanocrystals embedded within SiO2nanodots were obtained, having sizes in the few tens of nanometer range. The fabricated ordered structures show significant potential for applications either in basic physics experiments or as building blocks for nanoelectronic and nanophotonic devices.

UR - http://www.scopus.com/inward/record.url?scp=58149236817&partnerID=8YFLogxK

U2 - 10.1088/0957-4484/19/49/495605

DO - 10.1088/0957-4484/19/49/495605

M3 - Article

VL - 19

JO - Nanotechnology

T2 - Nanotechnology

JF - Nanotechnology

SN - 0957-4484

IS - 49

M1 - 495605

ER -

Nassiopoulou AG, Gianneta VV, Huffman M, Reading MA, Van Den Berg JA, Tsiaoussis I et al. Self-assembled hexagonal ordering of Si nanocrystals embedded in SiO2nanodots. Nanotechnology. 2008 Nov 19;19(49). 495605. https://doi.org/10.1088/0957-4484/19/49/495605