TY - JOUR
T1 - Soft Hydrothermal Synthesis of Hafnon, HfSiO4
AU - Estevenon, Paul
AU - Kaczmarek, Thibault
AU - Rafiuddin, Mohamed Ruwaid
AU - Welcomme, Eleonore
AU - Szenknect, Stephanie
AU - Mesbah, Adel
AU - Moisy, Philippe
AU - Poinssot, Christophe
AU - Dacheux, Nicolas
N1 - Publisher Copyright:
Copyright © 2020 American Chemical Society.
Copyright:
Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2020/3/4
Y1 - 2020/3/4
N2 - Despite being a member of the zircon-type silicate family, the conditions allowing the hydrothermal synthesis of HfSiO4 are not well constrained. A multiparametric study was performed in order to follow the synthesis of this phase under soft hydrothermal conditions and thus to determine the most efficient conditions to form single phase samples. Among the experimental parameters investigated, concentration of reactants, pH of the reactive media, temperature and duration of the hydrothermal treatment impacted significantly the formation rate of hafnon and its crystallization state. Pure HfSiO4 was obtained in acid reactive media with an acidity ranging from CHCl = 1.5 M to pH = 1.0 and for CSi ≈ CHf ≥ 0.21 mol·L-1. The silicate phase was obtained after a 24 h treatment at temperatures ranging from 150 to 250 °C. However, the rise of temperature and extension of the duration of the hydrothermal treatment favored the crystallization state of the final HfSiO4 samples.
AB - Despite being a member of the zircon-type silicate family, the conditions allowing the hydrothermal synthesis of HfSiO4 are not well constrained. A multiparametric study was performed in order to follow the synthesis of this phase under soft hydrothermal conditions and thus to determine the most efficient conditions to form single phase samples. Among the experimental parameters investigated, concentration of reactants, pH of the reactive media, temperature and duration of the hydrothermal treatment impacted significantly the formation rate of hafnon and its crystallization state. Pure HfSiO4 was obtained in acid reactive media with an acidity ranging from CHCl = 1.5 M to pH = 1.0 and for CSi ≈ CHf ≥ 0.21 mol·L-1. The silicate phase was obtained after a 24 h treatment at temperatures ranging from 150 to 250 °C. However, the rise of temperature and extension of the duration of the hydrothermal treatment favored the crystallization state of the final HfSiO4 samples.
KW - Chlorine compounds
KW - Hafnium compounds
KW - Silicate minerals
KW - Silicon
KW - Zircon
KW - Hydrothermal synthesis
UR - http://www.scopus.com/inward/record.url?scp=85081162117&partnerID=8YFLogxK
U2 - 10.1021/acs.cgd.9b01546
DO - 10.1021/acs.cgd.9b01546
M3 - Article
AN - SCOPUS:85081162117
VL - 20
SP - 1820
EP - 1828
JO - Crystal Growth and Design
JF - Crystal Growth and Design
SN - 1528-7483
IS - 3
ER -