Sputtering of Au thin films has been determined for Xe ions with energies between 50 and 600 keV. In-situ transmission electron microscopy was used to observe sputtered Au during deposition on a carbon foil near the specimen. Total reflection and transmission sputtering yields for a 62 nm thick Au thin film were determined by ex-situ measurement of the total amount of Au on the carbon foils. In situ observations show that individual Xe ions eject Au nanoparticles as large as 7 nm in diameter with an average diameter of approximately 3 nm. Particle emission correlates with crater formation due to single ion impacts. Nanoparticle emission contributes significantly to the total sputtering yield for Xe ions in this energy range in either reflection or transmission geometry.
|Number of pages||5|
|Journal||Materials Research Society Symposium - Proceedings|
|Publication status||Published - 1 Dec 1999|
|Event||Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing - Boston, United States|
Duration: 29 Nov 2000 → 2 Dec 2000