Sputtering of Au induced by single Xe ion impacts

R. C. Birtcher; S. E. Donnelly

doi:10.1557/PROC-585-117

Sputtering of Au induced by single Xe ion impacts

R. C. Birtcher, S. E. Donnelly

Research output: Contribution to journal › Conference article › peer-review

3 Citations (Scopus)

Abstract

Sputtering of Au thin films has been determined for Xe ions with energies between 50 and 600 keV. In-situ transmission electron microscopy was used to observe sputtered Au during deposition on a carbon foil near the specimen. Total reflection and transmission sputtering yields for a 62 nm thick Au thin film were determined by ex-situ measurement of the total amount of Au on the carbon foils. In situ observations show that individual Xe ions eject Au nanoparticles as large as 7 nm in diameter with an average diameter of approximately 3 nm. Particle emission correlates with crater formation due to single ion impacts. Nanoparticle emission contributes significantly to the total sputtering yield for Xe ions in this energy range in either reflection or transmission geometry.

Original language	English
Pages (from-to)	117-121
Number of pages	5
Journal	Materials Research Society Symposium - Proceedings
Volume	585
DOIs	https://doi.org/10.1557/PROC-585-117
Publication status	Published - 1 Dec 1999
Externally published	Yes
Event	Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing - Boston, United States Duration: 29 Nov 2000 → 2 Dec 2000

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title = "Sputtering of Au induced by single Xe ion impacts",

abstract = "Sputtering of Au thin films has been determined for Xe ions with energies between 50 and 600 keV. In-situ transmission electron microscopy was used to observe sputtered Au during deposition on a carbon foil near the specimen. Total reflection and transmission sputtering yields for a 62 nm thick Au thin film were determined by ex-situ measurement of the total amount of Au on the carbon foils. In situ observations show that individual Xe ions eject Au nanoparticles as large as 7 nm in diameter with an average diameter of approximately 3 nm. Particle emission correlates with crater formation due to single ion impacts. Nanoparticle emission contributes significantly to the total sputtering yield for Xe ions in this energy range in either reflection or transmission geometry.",

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TY - JOUR

T1 - Sputtering of Au induced by single Xe ion impacts

AU - Birtcher, R. C.

AU - Donnelly, S. E.

PY - 1999/12/1

Y1 - 1999/12/1

N2 - Sputtering of Au thin films has been determined for Xe ions with energies between 50 and 600 keV. In-situ transmission electron microscopy was used to observe sputtered Au during deposition on a carbon foil near the specimen. Total reflection and transmission sputtering yields for a 62 nm thick Au thin film were determined by ex-situ measurement of the total amount of Au on the carbon foils. In situ observations show that individual Xe ions eject Au nanoparticles as large as 7 nm in diameter with an average diameter of approximately 3 nm. Particle emission correlates with crater formation due to single ion impacts. Nanoparticle emission contributes significantly to the total sputtering yield for Xe ions in this energy range in either reflection or transmission geometry.

AB - Sputtering of Au thin films has been determined for Xe ions with energies between 50 and 600 keV. In-situ transmission electron microscopy was used to observe sputtered Au during deposition on a carbon foil near the specimen. Total reflection and transmission sputtering yields for a 62 nm thick Au thin film were determined by ex-situ measurement of the total amount of Au on the carbon foils. In situ observations show that individual Xe ions eject Au nanoparticles as large as 7 nm in diameter with an average diameter of approximately 3 nm. Particle emission correlates with crater formation due to single ion impacts. Nanoparticle emission contributes significantly to the total sputtering yield for Xe ions in this energy range in either reflection or transmission geometry.

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DO - 10.1557/PROC-585-117

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AN - SCOPUS:0034504910

VL - 585

SP - 117

EP - 121

JO - MRS Online Proceedings Library

JF - MRS Online Proceedings Library

SN - 0272-9172

T2 - Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing

Y2 - 29 November 2000 through 2 December 2000

ER -

Sputtering of Au induced by single Xe ion impacts

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