Sputtering of Au induced by single Xe ion impacts

R. C. Birtcher, S. E. Donnelly

Research output: Contribution to journalConference article

3 Citations (Scopus)

Abstract

Sputtering of Au thin films has been determined for Xe ions with energies between 50 and 600 keV. In-situ transmission electron microscopy was used to observe sputtered Au during deposition on a carbon foil near the specimen. Total reflection and transmission sputtering yields for a 62 nm thick Au thin film were determined by ex-situ measurement of the total amount of Au on the carbon foils. In situ observations show that individual Xe ions eject Au nanoparticles as large as 7 nm in diameter with an average diameter of approximately 3 nm. Particle emission correlates with crater formation due to single ion impacts. Nanoparticle emission contributes significantly to the total sputtering yield for Xe ions in this energy range in either reflection or transmission geometry.

Original languageEnglish
Pages (from-to)117-121
Number of pages5
JournalMaterials Research Society Symposium - Proceedings
Volume585
DOIs
Publication statusPublished - 1 Dec 1999
Externally publishedYes
EventFundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing - Boston, United States
Duration: 29 Nov 20002 Dec 2000

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