Substrate Influence on Topography and Chemical Composition of Thin Metal Films Produced by Means of Self-Ion Assisted Deposition

I. S. Tashlykov, V. Vishnyakov, A. Wirth

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

SEM, RBS, EDX and EDX mapping were used to characterise rubber and silicon surface modified by means of self-ion assisted deposition (SIAD). It was found that SIAD of Cr, Zr and W are accompanied by incorporating of C, O, Al and Si into a coating, what can promote a creation of observed grainless layers. Modified rubber surfaces have quasi-periodical topography which may be due to build in stress as a result of self-ion bombardment. Evolution of RBS signals from metal and incorporated elements are associated with an intermixing effects in the layer/substrate region.

Original languageEnglish
Pages (from-to)167-170
Number of pages4
JournalMaterials Science Forum
Volume248-249
DOIs
Publication statusPublished - 29 May 1997
Externally publishedYes

Fingerprint

Rubber
metal films
Topography
Energy dispersive spectroscopy
topography
chemical composition
Metals
Ions
rubber
Silicon
Substrates
Ion bombardment
Chemical analysis
Chemical elements
ions
Coatings
Scanning electron microscopy
bombardment
coatings
scanning electron microscopy

Cite this

@article{65d7766ee619423f9152ce43094fc10f,
title = "Substrate Influence on Topography and Chemical Composition of Thin Metal Films Produced by Means of Self-Ion Assisted Deposition",
abstract = "SEM, RBS, EDX and EDX mapping were used to characterise rubber and silicon surface modified by means of self-ion assisted deposition (SIAD). It was found that SIAD of Cr, Zr and W are accompanied by incorporating of C, O, Al and Si into a coating, what can promote a creation of observed grainless layers. Modified rubber surfaces have quasi-periodical topography which may be due to build in stress as a result of self-ion bombardment. Evolution of RBS signals from metal and incorporated elements are associated with an intermixing effects in the layer/substrate region.",
keywords = "Rubber, Self-Ion Assisted Deposition, Silicon, Thin Films",
author = "Tashlykov, {I. S.} and V. Vishnyakov and A. Wirth",
year = "1997",
month = "5",
day = "29",
doi = "10.4028/www.scientific.net/MSF.248-249.167",
language = "English",
volume = "248-249",
pages = "167--170",
journal = "Materials Science Forum",
issn = "0255-5476",
publisher = "Trans Tech Publications",

}

Substrate Influence on Topography and Chemical Composition of Thin Metal Films Produced by Means of Self-Ion Assisted Deposition. / Tashlykov, I. S.; Vishnyakov, V.; Wirth, A.

In: Materials Science Forum, Vol. 248-249, 29.05.1997, p. 167-170.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Substrate Influence on Topography and Chemical Composition of Thin Metal Films Produced by Means of Self-Ion Assisted Deposition

AU - Tashlykov, I. S.

AU - Vishnyakov, V.

AU - Wirth, A.

PY - 1997/5/29

Y1 - 1997/5/29

N2 - SEM, RBS, EDX and EDX mapping were used to characterise rubber and silicon surface modified by means of self-ion assisted deposition (SIAD). It was found that SIAD of Cr, Zr and W are accompanied by incorporating of C, O, Al and Si into a coating, what can promote a creation of observed grainless layers. Modified rubber surfaces have quasi-periodical topography which may be due to build in stress as a result of self-ion bombardment. Evolution of RBS signals from metal and incorporated elements are associated with an intermixing effects in the layer/substrate region.

AB - SEM, RBS, EDX and EDX mapping were used to characterise rubber and silicon surface modified by means of self-ion assisted deposition (SIAD). It was found that SIAD of Cr, Zr and W are accompanied by incorporating of C, O, Al and Si into a coating, what can promote a creation of observed grainless layers. Modified rubber surfaces have quasi-periodical topography which may be due to build in stress as a result of self-ion bombardment. Evolution of RBS signals from metal and incorporated elements are associated with an intermixing effects in the layer/substrate region.

KW - Rubber

KW - Self-Ion Assisted Deposition

KW - Silicon

KW - Thin Films

UR - http://www.scopus.com/inward/record.url?scp=4143113512&partnerID=8YFLogxK

U2 - 10.4028/www.scientific.net/MSF.248-249.167

DO - 10.4028/www.scientific.net/MSF.248-249.167

M3 - Article

VL - 248-249

SP - 167

EP - 170

JO - Materials Science Forum

JF - Materials Science Forum

SN - 0255-5476

ER -