Substrate Influence on Topography and Chemical Composition of Thin Metal Films Produced by Means of Self-Ion Assisted Deposition

I. S. Tashlykov, V. Vishnyakov, A. Wirth

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

SEM, RBS, EDX and EDX mapping were used to characterise rubber and silicon surface modified by means of self-ion assisted deposition (SIAD). It was found that SIAD of Cr, Zr and W are accompanied by incorporating of C, O, Al and Si into a coating, what can promote a creation of observed grainless layers. Modified rubber surfaces have quasi-periodical topography which may be due to build in stress as a result of self-ion bombardment. Evolution of RBS signals from metal and incorporated elements are associated with an intermixing effects in the layer/substrate region.

Original languageEnglish
Pages (from-to)167-170
Number of pages4
JournalMaterials Science Forum
Volume248-249
DOIs
Publication statusPublished - 29 May 1997
Externally publishedYes

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