Abstract
Surface roughness of bias sputtered CoCrTa films on glass substrates were studied using an Atomic Force Microscope (AFM) and an interferometer (non contact) optical technique (IOT). Contact angles of the coated disks were measured using a goniometer microscope. Wear tests were performed on the bias sputtered films. The results of these investigations are presented.
| Original language | English |
|---|---|
| Pages (from-to) | 3681-3683 |
| Number of pages | 3 |
| Journal | IEEE Transactions on Magnetics |
| Volume | 32 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - Sep 1996 |
| Externally published | Yes |
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Surface roughness and contact angle of bias sputtered CoCrTa film. / Chandrasekhar, R.; Mapps, D. J.; Blunt, L.
In: IEEE Transactions on Magnetics, Vol. 32, No. 5, 09.1996, p. 3681-3683.Research output: Contribution to journal › Article
TY - JOUR
T1 - Surface roughness and contact angle of bias sputtered CoCrTa film
AU - Chandrasekhar, R.
AU - Mapps, D. J.
AU - Blunt, L.
PY - 1996/9
Y1 - 1996/9
N2 - Surface roughness of bias sputtered CoCrTa films on glass substrates were studied using an Atomic Force Microscope (AFM) and an interferometer (non contact) optical technique (IOT). Contact angles of the coated disks were measured using a goniometer microscope. Wear tests were performed on the bias sputtered films. The results of these investigations are presented.
AB - Surface roughness of bias sputtered CoCrTa films on glass substrates were studied using an Atomic Force Microscope (AFM) and an interferometer (non contact) optical technique (IOT). Contact angles of the coated disks were measured using a goniometer microscope. Wear tests were performed on the bias sputtered films. The results of these investigations are presented.
KW - Rough surfaces
KW - Surface roughness
KW - Optical films
KW - Atomic force microscopy
KW - Atom optics
KW - Optical microscopy
KW - Optical interferometry
KW - Glass
KW - Substrates
KW - Atomic measurements
UR - http://www.scopus.com/inward/record.url?scp=0030246791&partnerID=8YFLogxK
U2 - 10.1109/20.538727
DO - 10.1109/20.538727
M3 - Article
AN - SCOPUS:0030246791
VL - 32
SP - 3681
EP - 3683
JO - IEEE Transactions on Magnetics
JF - IEEE Transactions on Magnetics
SN - 0018-9464
IS - 5
ER -