Surface Texture Evolution of Fused Silica in a Combined Process of Atmospheric Pressure Plasma Processing and Bonnet Polishing

Xing Su, Chenglong Ji, Yang Xu, Duo Li, David Walker, Guoyu Yu, Hongyu Li, Bo Wang

Research output: Contribution to journalArticle

Abstract

The increasing demand for precision optical components invokes the requirement of advanced fabrication techniques with high efficiency. Atmospheric pressure plasma processing (APPP), based on chemical etching, has a high material removal rate and a Gaussian-shaped influence function, which is suitable to generate complex structures and correct form errors. Because of the pure chemical etching, an optically smooth surface cannot be achieved using only APPP. Thus, bonnet polishing (BP) with a flexible membrane tool, also delivering a Gaussian influence-function, is introduced to smooth the surface after APPP. In this paper, the surface texture evolution in the combined process of APPP and BP is studied. The etched texture with increased removal depth of APPP is presented and analyzed. Subsequently, the processed substrates are smoothed by BP. The texture smoothing and the roughness improvement is investigated in detail. The experimental results show that the APPP etched pits coalesce with each other and transform into irregular convex-concave structures, with roughness degraded to about 25 nm arithmetical mean deviation (Ra). The APPP etched texture can be successfully smoothed to 1.5 nm Ra, with 0.2–1 μm material removal of BP.
Original languageEnglish
Article number676
Number of pages13
JournalCoatings
Volume9
Issue number10
DOIs
Publication statusPublished - 18 Oct 2019

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Plasma applications
Fused silica
Polishing
polishing
Atmospheric pressure
atmospheric pressure
textures
Textures
silicon dioxide
machining
Etching
roughness
Surface roughness
etching
smoothing
membranes
Membranes
deviation
Fabrication
requirements

Cite this

@article{e3abb9198ad6461fb9bba03bfdec28ba,
title = "Surface Texture Evolution of Fused Silica in a Combined Process of Atmospheric Pressure Plasma Processing and Bonnet Polishing",
abstract = "The increasing demand for precision optical components invokes the requirement of advanced fabrication techniques with high efficiency. Atmospheric pressure plasma processing (APPP), based on chemical etching, has a high material removal rate and a Gaussian-shaped influence function, which is suitable to generate complex structures and correct form errors. Because of the pure chemical etching, an optically smooth surface cannot be achieved using only APPP. Thus, bonnet polishing (BP) with a flexible membrane tool, also delivering a Gaussian influence-function, is introduced to smooth the surface after APPP. In this paper, the surface texture evolution in the combined process of APPP and BP is studied. The etched texture with increased removal depth of APPP is presented and analyzed. Subsequently, the processed substrates are smoothed by BP. The texture smoothing and the roughness improvement is investigated in detail. The experimental results show that the APPP etched pits coalesce with each other and transform into irregular convex-concave structures, with roughness degraded to about 25 nm arithmetical mean deviation (Ra). The APPP etched texture can be successfully smoothed to 1.5 nm Ra, with 0.2–1 μm material removal of BP.",
keywords = "Optical surface, atmospheric pressure plasma processing, bonnet polishing, surface texture",
author = "Xing Su and Chenglong Ji and Yang Xu and Duo Li and David Walker and Guoyu Yu and Hongyu Li and Bo Wang",
year = "2019",
month = "10",
day = "18",
doi = "10.3390/coatings9100676",
language = "English",
volume = "9",
journal = "Coatings",
issn = "2079-6412",
publisher = "MDPI AG",
number = "10",

}

Surface Texture Evolution of Fused Silica in a Combined Process of Atmospheric Pressure Plasma Processing and Bonnet Polishing. / Su, Xing; Ji, Chenglong; Xu, Yang; Li, Duo; Walker, David; Yu, Guoyu; Li, Hongyu; Wang, Bo.

In: Coatings, Vol. 9, No. 10, 676, 18.10.2019.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Surface Texture Evolution of Fused Silica in a Combined Process of Atmospheric Pressure Plasma Processing and Bonnet Polishing

AU - Su, Xing

AU - Ji, Chenglong

AU - Xu, Yang

AU - Li, Duo

AU - Walker, David

AU - Yu, Guoyu

AU - Li, Hongyu

AU - Wang, Bo

PY - 2019/10/18

Y1 - 2019/10/18

N2 - The increasing demand for precision optical components invokes the requirement of advanced fabrication techniques with high efficiency. Atmospheric pressure plasma processing (APPP), based on chemical etching, has a high material removal rate and a Gaussian-shaped influence function, which is suitable to generate complex structures and correct form errors. Because of the pure chemical etching, an optically smooth surface cannot be achieved using only APPP. Thus, bonnet polishing (BP) with a flexible membrane tool, also delivering a Gaussian influence-function, is introduced to smooth the surface after APPP. In this paper, the surface texture evolution in the combined process of APPP and BP is studied. The etched texture with increased removal depth of APPP is presented and analyzed. Subsequently, the processed substrates are smoothed by BP. The texture smoothing and the roughness improvement is investigated in detail. The experimental results show that the APPP etched pits coalesce with each other and transform into irregular convex-concave structures, with roughness degraded to about 25 nm arithmetical mean deviation (Ra). The APPP etched texture can be successfully smoothed to 1.5 nm Ra, with 0.2–1 μm material removal of BP.

AB - The increasing demand for precision optical components invokes the requirement of advanced fabrication techniques with high efficiency. Atmospheric pressure plasma processing (APPP), based on chemical etching, has a high material removal rate and a Gaussian-shaped influence function, which is suitable to generate complex structures and correct form errors. Because of the pure chemical etching, an optically smooth surface cannot be achieved using only APPP. Thus, bonnet polishing (BP) with a flexible membrane tool, also delivering a Gaussian influence-function, is introduced to smooth the surface after APPP. In this paper, the surface texture evolution in the combined process of APPP and BP is studied. The etched texture with increased removal depth of APPP is presented and analyzed. Subsequently, the processed substrates are smoothed by BP. The texture smoothing and the roughness improvement is investigated in detail. The experimental results show that the APPP etched pits coalesce with each other and transform into irregular convex-concave structures, with roughness degraded to about 25 nm arithmetical mean deviation (Ra). The APPP etched texture can be successfully smoothed to 1.5 nm Ra, with 0.2–1 μm material removal of BP.

KW - Optical surface

KW - atmospheric pressure plasma processing

KW - bonnet polishing

KW - surface texture

U2 - 10.3390/coatings9100676

DO - 10.3390/coatings9100676

M3 - Article

VL - 9

JO - Coatings

JF - Coatings

SN - 2079-6412

IS - 10

M1 - 676

ER -