TY - JOUR
T1 - Synthesis and characterisation of high-entropy alloy thin films as candidates for coating nuclear fuel cladding alloys
AU - Tunes, Matheus Araujo
AU - Vishnyakov, Vladimir
AU - Donnelly, Stephen
PY - 2018/3/1
Y1 - 2018/3/1
N2 - Thin films of the quaternary system FeCrMnNi were synthesised by ion beam sputter-deposition. The films were deposited on a silicon substrate at approximately 350 K. A high-entropy alloy thin film (HEATF) and a non-equiatomic thin film were obtained. Energy Dispersive X-ray Spectroscopy (EDX) and Transmission Electron Microscopy (TEM) were used to determine thin film composition and the atomic structure. The non-equiatomic thin film exhibited a polycrystalline structure with nanometre-sized grains. Microstructural analysis of the HEATF, which had close to equimolar composition, showed large crystals and planar defects. The microstructural differences between the HEATF and the non-equiatomic thin film are discussed in terms of current high-entropy alloy theory, previous work on thin films and nucleation theory.
AB - Thin films of the quaternary system FeCrMnNi were synthesised by ion beam sputter-deposition. The films were deposited on a silicon substrate at approximately 350 K. A high-entropy alloy thin film (HEATF) and a non-equiatomic thin film were obtained. Energy Dispersive X-ray Spectroscopy (EDX) and Transmission Electron Microscopy (TEM) were used to determine thin film composition and the atomic structure. The non-equiatomic thin film exhibited a polycrystalline structure with nanometre-sized grains. Microstructural analysis of the HEATF, which had close to equimolar composition, showed large crystals and planar defects. The microstructural differences between the HEATF and the non-equiatomic thin film are discussed in terms of current high-entropy alloy theory, previous work on thin films and nucleation theory.
KW - Accident tolerant fuels
KW - Energy dispersive X-ray spectroscopy
KW - High entropy alloys
KW - Ion-beam sputter-deposition
KW - Transmission electron microscopy
U2 - 10.1016/j.tsf.2018.01.041
DO - 10.1016/j.tsf.2018.01.041
M3 - Article
VL - 649
SP - 115
EP - 120
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
ER -