Total concentration approach for three-dimensional diffusion-controlled wet chemical etching

P. Rath, J. C. Chai, H. Zheng, Y. C. Lam, V. M. Murukeshan

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

A total concentration fixed-grid method is used in this article to model the three-dimensional diffusion-controlled wet chemical etching. A total concentration is defined as the sum of the unreacted and the reacted etchant concentrations. The governing mass diffusion equation based on the total concentration includes the interface condition. The reacted concentration of etchant is a measure of the etchfront position. With this approach the etchfront can be found implicitly. For demonstration purposes, the finite-volume method is used to solve the resulting set of governing equations with initial and boundary conditions. The effect of mask thickness on the etchfront surface evolution is studied. The condition at which a three-dimensional etching is converted into two-dimensional is also presented.

Original languageEnglish
Pages (from-to)3408-3416
Number of pages9
JournalInternational Journal of Heat and Mass Transfer
Volume49
Issue number19-20
Early online date11 May 2006
DOIs
Publication statusPublished - Sep 2006
Externally publishedYes

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Wet etching
etching
Finite volume method
etchants
Masks
Etching
Demonstrations
Boundary conditions
finite volume method
masks
grids
boundary conditions

Cite this

Rath, P. ; Chai, J. C. ; Zheng, H. ; Lam, Y. C. ; Murukeshan, V. M. / Total concentration approach for three-dimensional diffusion-controlled wet chemical etching. In: International Journal of Heat and Mass Transfer. 2006 ; Vol. 49, No. 19-20. pp. 3408-3416.
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Total concentration approach for three-dimensional diffusion-controlled wet chemical etching. / Rath, P.; Chai, J. C.; Zheng, H.; Lam, Y. C.; Murukeshan, V. M.

In: International Journal of Heat and Mass Transfer, Vol. 49, No. 19-20, 09.2006, p. 3408-3416.

Research output: Contribution to journalArticle

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