Towards the Understanding of Restive Contrast Imaging in in-situ Dielectric Breakdown Studies Using a Nanoprober Setup

Konstantina Lambrinou, Kai Arstila, Thomas Hantschel, Andreas Rummel, Zsolt Tokei, Marianna Pantouvaki, Kristof Croes, Piotr Czarnecki, Laure Carbonell, Olivier Richard, Stephan Kleindiek, Ingrid De Wolf, Wilfried Vandervorst

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

This work aims at attaining a more complete understanding of the principles governing resistive contrast imaging (RCI) of copper/low-k interconnects used for dielectric breakdown studies in a nanoprober scanning electron microscope (SEM) system. RCI is employed in such in situ dielectric breakdown studies to facilitate the localization of interconnect defect sites related to various stages in the degradation process of the low-k dielectric material. This work shows that RCI is suitable for detecting high-resistance sites, like opens, in copper/low-k interconnects. Moreover, RCI demonstrates potential in locating defects that lie deep in the test structure and are, thus, not detectable by SEM. A model is also proposed to explain the formation of RCI images of specific interconnect test structures with complex layout.

Original languageEnglish
Title of host publicationSymposia E/F - Advanced Interconnects and Chemical Mechanical Planarization for Micro-and Nanoelectronics
EditorsC. Bonafos, Y. Fujisaki, P. Dimitrakis, E. Tokumitsu
PublisherCambridge University Press
Pages281-286
Number of pages6
Volume1249
ISBN (Print)9781605112268, 1605112267
DOIs
Publication statusPublished - 2010
Externally publishedYes
Event2010 MRS Spring Meeting - San Francisco, United States
Duration: 5 Apr 20109 Apr 2010
https://www.mrs.org/spring2010

Conference

Conference2010 MRS Spring Meeting
CountryUnited States
CitySan Francisco
Period5/04/109/04/10
Internet address

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Lambrinou, K., Arstila, K., Hantschel, T., Rummel, A., Tokei, Z., Pantouvaki, M., ... Vandervorst, W. (2010). Towards the Understanding of Restive Contrast Imaging in in-situ Dielectric Breakdown Studies Using a Nanoprober Setup. In C. Bonafos, Y. Fujisaki, P. Dimitrakis, & E. Tokumitsu (Eds.), Symposia E/F - Advanced Interconnects and Chemical Mechanical Planarization for Micro-and Nanoelectronics (Vol. 1249, pp. 281-286). Cambridge University Press. https://doi.org/10.1557/PROC-1249-F08-14