Understanding the EOT–Jg degradation in Ru/SrTiOx/Ru metal–insulator–metal capacitors formed with Ru atomic layer deposition

M. Popovici, A. Redolfi, M. Aoulaiche, Jakob Van Den Berg, B. Douhard, J. Swerts, P. Bailey, B. Kaczer, B. Groven, J. Meersschaut, T. Conard, A. Moussa, C. Adelmann, A. Delabie, P. Fazan, S. Van Elshocht, M. Jurczak

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