VV and VO2 defects in silicon studied with hybrid density functional theory

S. R.G. Christopoulos, H. Wang, A. Chroneos, C. A. Londos, E. N. Sgourou, U. Schwingenschlögl

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

The formation of VO (A-center), VV and VO2 defects in irradiated Czochralski-grown silicon (Si) is of technological importance. Recent theoretical studies have examined the formation and charge states of the A-center in detail. Here we use density functional theory employing hybrid functionals to analyze the formation of VV and VO2 defects. The formation energy as a function of the Fermi energy is calculated for all possible charge states. For the VV and VO2 defects double negatively charged and neutral states dominate, respectively.

Original languageEnglish
Pages (from-to)1568-1571
Number of pages4
JournalJournal of Materials Science: Materials in Electronics
Volume26
Issue number3
Early online date7 Dec 2014
DOIs
Publication statusPublished - 1 Mar 2015
Externally publishedYes

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